Electrochemical behavior of highly conductive boron-doped diamond electrodes for oxygen reduction in alkaline solution

Journal of the Electrochemical Society

Volumn 145, Issue 6, 1998, Pages 1870-1876

  Yano, T ^a   Tryk, D A ^a   Hashimoto, K ^a,b   Fujishima, A ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; DOPING (ADDITIVES); ELECTROCHEMISTRY; ELECTRONIC DENSITY OF STATES; OXYGEN; POLYCRYSTALLINE MATERIALS; POTASSIUM COMPOUNDS; REDUCTION; SURFACE STRUCTURE;

MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION; POTASSIUM HYDROXIDE;

ELECTROCHEMICAL ELECTRODES;

EID: 0032095137     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838569     Document Type: Article

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