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Volumn 52, Issue 9-10, 2012, Pages 2504-2507

Comparative study of electrical instabilities in InGaZnO thin film transistors with gate dielectrics

Author keywords

[No Author keywords available]

Indexed keywords

COMPARATIVE STUDIES; ELECTRICAL INSTABILITY; ELECTRICAL PERFORMANCE; GATE-BIAS STRESS; LIGHT ILLUMINATION; NEGATIVE GATE; STRESS CONDITION; TEST DEVICE;

EID: 84866731406     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microrel.2012.06.134     Document Type: Article
Times cited : (6)

References (10)
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    • High-performance InGaZnO thin film transistors using HfLaO gate dielectrics
    • N.C. Su, S.J. Wang, and A. Chin High-performance InGaZnO thin film transistors using HfLaO gate dielectrics IEEE Electron Device Lett 30 2009 1317 1319
    • (2009) IEEE Electron Device Lett , vol.30 , pp. 1317-1319
    • Su, N.C.1    Wang, S.J.2    Chin, A.3
  • 2
    • 66749143525 scopus 로고    scopus 로고
    • Bias stress induced stretched exponential time dependence of threshold voltage shit in InGaZnO thin film transistors
    • J.M. Lee, I.T. Cho, J.H. Lee, W.S. Cheong, C.S. Hwang, and H.I. Kwon Bias stress induced stretched exponential time dependence of threshold voltage shit in InGaZnO thin film transistors Appl Phys Lett 94 2009 222112
    • (2009) Appl Phys Lett , vol.94 , pp. 222112
    • Lee, J.M.1    Cho, I.T.2    Lee, J.H.3    Cheong, W.S.4    Hwang, C.S.5    Kwon, H.I.6
  • 4
    • 77956811460 scopus 로고    scopus 로고
    • Behaviors of InGaZnO thin film transistor under illuminated positive gate-bias stress
    • T.C. Chen, T.C. Chang, C.T. Tsai, T.Y. Hsieh, S.C. Chen, and C.S. Lin Behaviors of InGaZnO thin film transistor under illuminated positive gate-bias stress Appl Phys Lett 97 2010 112104
    • (2010) Appl Phys Lett , vol.97 , pp. 112104
    • Chen, T.C.1    Chang, T.C.2    Tsai, C.T.3    Hsieh, T.Y.4    Chen, S.C.5    Lin, C.S.6
  • 5
    • 38549145327 scopus 로고    scopus 로고
    • Bias stress stability of indium gallium zinc oxide channel based transparent thin film transistors
    • A. Suresh, and J.F. Muth Bias stress stability of indium gallium zinc oxide channel based transparent thin film transistors Appl Phys Lett 92 2008 033502
    • (2008) Appl Phys Lett , vol.92 , pp. 033502
    • Suresh, A.1    Muth, J.F.2
  • 6
    • 77955160907 scopus 로고    scopus 로고
    • O-vacancy as the origin of negative bias illumination stress instability in amorphous InGaZnO thin film transistors
    • B. Ryu, H.K. Noh, E.A. Choi, and K. Chang O-vacancy as the origin of negative bias illumination stress instability in amorphous InGaZnO thin film transistors Appl Phys Lett 97 2010 022108
    • (2010) Appl Phys Lett , vol.97 , pp. 022108
    • Ryu, B.1    Noh, H.K.2    Choi, E.A.3    Chang, K.4
  • 7
    • 79954618666 scopus 로고    scopus 로고
    • Time temperature dependence of positive gate bias stress and recovery in amorphous indiumgalliumzincoxide thin-film transistors
    • M.D.H. Chowdhury, P. Migliorato, and J. Jang Time temperature dependence of positive gate bias stress and recovery in amorphous indiumgalliumzincoxide thin-film transistors Appl Phys Lett 98 2011 153511
    • (2011) Appl Phys Lett , vol.98 , pp. 153511
    • Chowdhury, M.D.H.1    Migliorato, P.2    Jang, J.3
  • 9
    • 51349141239 scopus 로고    scopus 로고
    • Bias-stress-induced stretched-exponential time dependence of threshold voltage shift in InGaZnO thin film transistors
    • J.M. Lee, I.T. Cho, J.H. Lee, and H.I. Kwon Bias-stress-induced stretched-exponential time dependence of threshold voltage shift in InGaZnO thin film transistors Appl Phys Lett 93 2008 093504
    • (2008) Appl Phys Lett , vol.93 , pp. 093504
    • Lee, J.M.1    Cho, I.T.2    Lee, J.H.3    Kwon, H.I.4
  • 10
    • 78649291990 scopus 로고    scopus 로고
    • The impact of gate dielectric materials on the light-induced bias instability in HfInZnO thin film transistors
    • J.Y. Kwon, J.S. Jung, K.S. Son, K.H. Lee, J.S. Park, and T.S. Kim The impact of gate dielectric materials on the light-induced bias instability in HfInZnO thin film transistors Appl Phys Lett 97 2010 183503
    • (2010) Appl Phys Lett , vol.97 , pp. 183503
    • Kwon, J.Y.1    Jung, J.S.2    Son, K.S.3    Lee, K.H.4    Park, J.S.5    Kim, T.S.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.