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Volumn 358, Issue 17, 2012, Pages 2082-2085
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Local photoconductivity of microcrystalline silicon thin films excited by 442 nm HeCd laser measured by conductive atomic force microscopy
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Author keywords
Amorphous and nanocrystalline silicon films; Atomic force microscopy (AFM); Local photoconductivity
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Indexed keywords
AFM;
AMORPHOUS AND NANOCRYSTALLINE SILICON;
CONDUCTIVE ATOMIC FORCE MICROSCOPY;
CURRENT INTENSITY;
CURRENT LEVELS;
DIFFUSION LENGTH;
HE-CD LASERS;
MICROCRYSTALLINE SILICON THIN FILMS;
NANOCANTILEVERS;
PHOTOCONDUCTIVITY;
THIN FILMS;
ATOMIC FORCE MICROSCOPY;
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EID: 84865778401
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2012.01.015 Document Type: Conference Paper |
Times cited : (5)
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References (13)
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