Geometrical properties of multilayer nano-imprint-lithography molds for optical applications

Microelectronic Engineering

Volumn 98, Issue , 2012, Pages 284-287

  Finn, Andreas ^a   Hensel, René ^b   Hagemann, Falk ^c   Kirchner, Robert ^a   Jahn, Andreas ^a   Fischer, Wolf Joachim ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b LEIBNIZ INSTITUTE OF POLYMER RESEARCH DRESDEN   (Germany)

^c SAW Components GmbH   (Germany)

Author keywords

3D mold; Non wetting template; Print; Residual layer free; Reverse imprint; Soft mold; UV nanoimprint

Indexed keywords

NON-WETTING; PRINT; RESIDUAL LAYERS; REVERSE IMPRINT; SOFT MOLD; UV-NANOIMPRINT;

CURING; MOLDS; NANOSENSORS; OPTICAL MULTILAYERS; OPTICS; THREE DIMENSIONAL; WAVEGUIDES; WETTING;

NANOIMPRINT LITHOGRAPHY;

EID: 84865610116     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2012.04.022     Document Type: Conference Paper

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