Fabrication of photonic crystals for applications in the visible range by Nanoimprint Lithography

Photonics and Nanostructures - Fundamentals and Applications

Volumn 9, Issue 3, 2011, Pages 248-254

  Senn, T ^a   Bischoff, J ^a   Nusse N ^a   Schoengen, M ^a   Lochel B ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

Nanoimprint Lithography; Photonic crystal; Visible range

Indexed keywords

FABRICATED STRUCTURES; FABRICATION OF PHOTONIC CRYSTALS; FABRICATION TECHNOLOGIES; FURTHER DEVELOPMENT; MASS PRODUCTION; NITRIDE LAYERS; NITRIDE MEMBRANES; OPTICAL CIRCUITS; OXIDE LAYER; PARAMETER OPTIMIZATION; SACRIFICIAL LAYER; SI SUBSTRATES; TRANSMISSION SPECTRUMS; VISIBLE RANGE;

CRYSTAL STRUCTURE; CRYSTALS; ELECTRON BEAMS; FABRICATION; NITRIDES; PHOTONIC BAND GAP; REACTIVE ION ETCHING; STRUCTURAL OPTIMIZATION; SUBSTRATES; WAVEGUIDES;

NANOIMPRINT LITHOGRAPHY;

EID: 79959988909     PISSN: 15694410     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.photonics.2011.04.007     Document Type: Article

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