Spatial evolution of the electron energy distribution function in a low-pressure capacitively coupled plasma containing argon and krypton

Plasma Sources Science and Technology

Volumn 21, Issue 4, 2012, Pages

  Zhu, Xi Ming ^a   Chen, Wen Cong ^a   Li, Jiang ^a   Cheng, Zhi Wen ^a   Pu, Yi Kang ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AXIAL DIRECTION; CAPACITIVELY COUPLED PLASMAS; ELECTRON ENERGY DISTRIBUTION FUNCTIONS; ENERGY RELAXATION; HIGH-ENERGY ELECTRON; HIGH-VOLTAGE SHEATH; LINE RATIO METHOD; MODE TRANSITIONS; OPTICAL EMISSIONS; PARALLEL-PLATE ELECTRODES; RF-POWER; SHARP INCREASE; SPATIAL EVOLUTION;

INDUCTIVELY COUPLED PLASMA;

ELECTRON ENERGY ANALYZERS;

EID: 84864656178     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/21/4/045009     Document Type: Article

References (31)

1. Godyak V A 2006 IEEE Trans. Plasma Sci. 34 755-66
2. Abdel-Fattah E and Sugai H 2003 Appl. Phys. Lett. 83 1533-5
3. Pu Y K et al 2006 Plasma Phys. Control. Fusion 48 61-70 (Pubitemid 41832778)
4. Crintea D L et al 2009 J. Phys. D: Appl. Phys. 42 045208
5. Kono A and Funahashi H 2002 J. Appl. Phys. 92 1757-63 (Pubitemid 34946396)
6. Fischer R and Dose V 1999 Plasma Phys. Control. Fusion 41 1109-23
7. Dodt D et al 2008 J. Phys. D: Appl. Phys. 41 205207
8. Boffard J B et al 2010 Plasma Sources Sci. Technol. 19 065001
9. Bibinov N K et al 1998 Plasma Sources Sci. Technol. 7 298-309
10. Donnelly V M 2004 J. Phys. D: Appl. Phys. 37 R217-36
11. Zhu X M and Pu Y K 2011 Plasma Sci. Technol. 13 267-78
12. Zhu X M et al 2012 Plasma Sources Sci. Technol. 21 024003
13. Godyak V A, Piejak R B and Alexandrovich B M 1992 Phys. Rev. Lett. 68 40-3
14. Li J et al 2011 J. Phys. D: Appl. Phys. 44 292001
15. Li J, Zhu X M and Pu Y K 2011 J. Phys. D: Appl. Phys. 44 455203
16. Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing (New York: Wiley)
17. Vahedi V et al 1993 Plasma Sources Sci. Technol. 2 261-72
18. Wang Z, Lichtenberg A J and Cohen R H 1999 Plasma Sources Sci. Technol. 8 151-61
19. Haas F A and Braithwaite N St J 2000 Plasma Sources Sci. Technol. 9 77-81 (Pubitemid 30549899)
20. Raju G G 2004 IEEE Trans. Dielectr. Electr. Insul. 11 649-73
21. Srivastava S K et al 1981 Phys. Rev. A 23 2156-66
22. Trajmar S et al 1981 Phys. Rev. A 23 2167-77
23. Iga I et al 1987 J. Phys. B: At. Mol. Opt. Phys. 20 1095-104
24. Pack J L et al 1992 J. Appl. Phys. 71 5363-71
25. Kobayashi A et al 2002 J. Phys. B: At. Mol. Opt. Phys. 35 2087-103 (Pubitemid 34550395)
26. Jung R O et al 2006 Phys. Rev. A 73 022722
27. Filipoviæ D M et al 2000 J. Phys. B: At. Mol. Opt. Phys. 33 677-91 (Pubitemid 30557471)
28. Kolobov V I and Godyak V A 1995 IEEE Trans. Plasma Sci. 23 503-31
29. Godyak V A and Khanneh A S 1986 IEEE Trans. Plasma Sci. 14 112-23
30. Chen W C et al 2009 Appl. Phys. Lett. 94 211503
31. Lieberman M A et al 2002 Plasma Sources Sci. Technol. 11 283-93 (Pubitemid 35023198)