A novel method of using the OES line ratio to determine the spatially resolved atomic density in low-temperature plasmas and its application in carbon and aluminium atoms in capacitively coupled plasmas

Journal of Physics D: Applied Physics

Volumn 44, Issue 45, 2011, Pages

  Li, Jiang ^a   Zhu, Xi Ming ^a   Pu, Yi Kang ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINIUM ATOMS; ARGON PLASMAS; ATOMIC DENSITY; CAPACITIVELY COUPLED PLASMAS; CARBON ATOMS; EMISSION LINES; ESCAPE FACTORS; LINE RATIO METHOD; LINE RATIOS; LOSS MECHANISMS; LOW TEMPERATURE PLASMAS; NOVEL METHODS; RADIATION TRAPPING; SPATIAL PROFILES; SPATIALLY RESOLVED;

ALUMINUM; ARGON; ATOMS; EMISSION SPECTROSCOPY; OPTICAL EMISSION SPECTROSCOPY; PLASMAS;

ATOMIC SPECTROSCOPY;

EID: 80055085375     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/44/45/455203     Document Type: Article

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