Drastic change in electrical properties of electrodeposited ZnO: Systematic study by hall effect measurements

Journal of Physical Chemistry C

Volumn 116, Issue 30, 2012, Pages 15925-15931

  Shinagawa, Tsutomu ^a   Chigane, Masaya ^a   Murase, Kuniaki ^b   Izaki, Masanobu ^c  

^a OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE   (Japan)

^b KYOTO UNIVERSITY   (Japan)

^c TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING EFFECTS; APPLIED CURRENT; C-AXIS ORIENTATIONS; DEPOSITION TEMPERATURES; GALVANOSTATICS; GOOD CORRELATIONS; HALL EFFECT MEASUREMENT; NANOSIZED HOLE; ORDERS OF MAGNITUDE; RESISTIVITY CHANGES; ROOM TEMPERATURE; STRUCTURAL CHARACTERIZATION; SYSTEMATIC STUDY; XRD; ZINC NITRATES; ZNO; ZNO FILMS;

CARRIER CONCENTRATION; ELECTRODEPOSITION; HALL EFFECT; METALLIC FILMS; ZINC OXIDE;

ELECTRIC PROPERTIES;

EID: 84864447232     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp304688v     Document Type: Article

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