Low resistance ohmic contacts to amorphous IGZO thin films by hydrogen plasma treatment

Surface and Coatings Technology

Volumn 206, Issue 24, 2012, Pages 5067-5071

  Yang, Su Hwan ^a   Kim, Jun Young ^a   Park, Min Joo ^a   Choi, Kwang Hyuk ^b   Kwak, Joon Seop ^a   Kim, Han Ki ^b   Lee, Ji Myon ^a  

^a Sunchon National University   (South Korea)

^b Kyung Hee University   (South Korea)

Author keywords

Amorphous IGZO; Hydrogen plasma treatment; Ohmic contact

Indexed keywords

GLASS SUBSTRATES; HCL SOLUTION; HIGH DENSITY; HYDROGEN PLASMA TREATMENTS; HYDROGEN PLASMAS; INDUCTIVELY-COUPLED; LOW RESISTANCE; O-H BOND; RADIO FREQUENCY MAGNETRON SPUTTERING; SPECIFIC CONTACT RESISTIVITY;

ELECTRIC CONTACTORS; ELECTRIC PROPERTIES; ELECTROMAGNETIC INDUCTION; INDIUM; OHMIC CONTACTS; PLASMA APPLICATIONS; SUBSTRATES; VOLTAGE DIVIDERS;

AMORPHOUS FILMS;

EID: 84864145983     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.06.017     Document Type: Article

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