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Volumn 520, Issue 18, 2012, Pages 5833-5845

Thirty years of rotatable magnetrons

Author keywords

History; Magnetron; Rotatable; Sputter deposition

Indexed keywords

BACKGROUND PRESSURE; CYLINDRICAL TARGET; DC MODE; MAGNET CONFIGURATIONS; MATERIAL INVENTORIES; PLANAR MAGNETRON; POWER DENSITIES; REACTIVE GAS; ROTATABLE; ROTATION SPEED; TARGET DESIGN; TARGET ROTATION; TWO BEAMS; UNIQUE FEATURES;

EID: 84862158642     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.04.065     Document Type: Review
Times cited : (38)

References (28)
  • 1
    • 0003688883 scopus 로고
    • U.S. Patent 4356073; Oct. 26, 1982, Filed Feb. 12, 1981 Cathodic Sputtering Apparatus, H.E. McKelvey U.S. Patent 4443318, April. 17, 1984, Filed Aug. 17, 1983 Rotatable Sputtering Apparatus; H.E. McKelvey U.S. Patent 4445997; May 1, 1984, Filed Aug. 17
    • Magnetron Cathode Sputtering Apparatus, H.E. McKelvey U.S. Patent 4356073; Oct. 26, 1982, Filed Feb. 12, 1981 Cathodic Sputtering Apparatus, H.E. McKelvey U.S. Patent 4443318, April. 17, 1984, Filed Aug. 17, 1983 Rotatable Sputtering Apparatus; H.E. McKelvey U.S. Patent 4445997; May 1, 1984, Filed Aug. 17, 1983
    • (1983) Magnetron Cathode Sputtering Apparatus
    • McKelvey, H.E.1
  • 3
    • 84878720944 scopus 로고
    • Forschungsinstitut Manfred Von Ardenne, 8051 Dresden, Zeppelinstrasse 7.D.D. DDR Patent DD 217964 A3, Filed Oct. 2
    • Einrichtung zum Hochratezerstäuben nach dem Plasmatronprinzip, Forschungsinstitut Manfred Von Ardenne, 8051 Dresden, Zeppelinstrasse 7.D.D. DDR Patent DD 217964 A3, Filed Oct. 2, 1981.
    • (1981) Einrichtung Zum Hochratezerstäuben Nach Dem Plasmatronprinzip


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.