Conformal coating of poly-glycidyl methacrylate as lithographic polymer via initiated chemical vapor deposition

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 11, Issue 2, 2012, Pages

  Yoshida, Shinya ^a   Kobayashi, Tatsuya ^a   Kumano, Masafumi ^a   Esashi, Masayoshi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

conformal coating; deep ultraviolet lithography; e beam lithography; initiated chemical vapor deposition; poly glycidyl methacrylate; resist coating technology

Indexed keywords

ASPECT RATIO; COATINGS; EXPERIMENTS; LITHOGRAPHY; VAPORS;

CONFORMAL COATINGS; DEPOSITION CONDITIONS; DEPOSITION EXPERIMENTS; E-BEAM LITHOGRAPHY; FLAT SURFACES; HIGH ASPECT RATIO; LINE-AND-SPACE; NANO-METER-SCALE; NON-PLANAR STRUCTURES; OPTIMAL CONDITIONS; POLY-GLYCIDYL METHACRYLATE; RESIST COATINGS; RESIST FILMS; SMOOTH SURFACE; THREE-DIMENSIONAL STRUCTURE;

CHEMICAL VAPOR DEPOSITION;

EID: 84862096977     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.JMM.11.2.023001     Document Type: Article

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