Fabrication of MOSFET capacitive sensor using spray coating method

IEEJ Transactions on Sensors and Micromachines

Volumn 127, Issue 3, 2007, Pages

  Aoyagi, Seiji ^a   Matsui, Yuichi ^a   Makihira, Kenji ^a   Tokunaga, Hiroshi ^b   Sasaki, Minoru ^c   Hane, Kazuhiro ^c  

^a KANSAI UNIVERSITY   (Japan)

^b M T C Corp

^c TOHOKU UNIVERSITY   (Japan)

Author keywords

FET sensor; High aspect ratio pillar; MOSFET sensor; SOI wafer; Spray coating of photoresist; Vertical sidewall

Indexed keywords

ACCELEROMETERS; ELECTRIC CURRENTS; ELECTRODES; GATE DIELECTRICS; SENSORS; SILICON ON INSULATOR TECHNOLOGY; SPRAY DRYING;

HIGH ASPECT RATIO PILLAR; SPRAY COATING OF PHOTORESIST; VERTICAL SIDEWALL;

MOSFET DEVICES;

EID: 33847775028     PISSN: 13418939     EISSN: 13475525     Source Type: Journal    
DOI: 10.1541/ieejsmas.127.153     Document Type: Conference Paper

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