Optimization of the electron-beam-lithography parameters for the moth-eye effects of an antireflection matrix structure

Journal of Applied Polymer Science

Volumn 102, Issue 6, 2006, Pages 5303-5313

  Kuo, Chung Feng Jeffrey ^a   Tu, Hung Min ^a   Su, Te Li ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Atomic force microscopy (AFM); Lithography; Nanotechnology

Indexed keywords

ATOMIC FORCE MICROSCOPY; NANOTECHNOLOGY; PHOTORESISTS; SILICON WAFERS;

ANTIREFLECTION MATRIX STRUCTURES; TAGUCHI QUALITY METHOD;

ELECTRON BEAM LITHOGRAPHY;

MATRIX; NEURAL NETWORK; OPTICAL PROPERTY; PROCESS CONTROL; SILICON;

EID: 33751350546     PISSN: 00218995     EISSN: 10974628     Source Type: Journal    
DOI: 10.1002/app.24827     Document Type: Article

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