Chemically homogeneous complex oxide thin films via improved substrate metallization

Advanced Functional Materials

Volumn 22, Issue 11, 2012, Pages 2295-2302

  Shelton, Christopher T ^a,b   Kotula, Paul G ^a   Brennecka, Geoff L ^a   Lam, Peter G ^b   Meyer, Kelsey E ^a   Maria, Jon Paul ^b   Gibbons, Brady J ^c   Ihlefeld, Jon F ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b North Carolina State University   (United States)

^c Oregon State University   (United States)

Author keywords

electrodes; electronic structures; ferroics; functional coatings; thin films

Indexed keywords

ADHESION LAYER; BATIO; BULK-LIKE; CHEMICAL DIFFUSION; CHEMICAL HOMOGENEITY; CHEMICAL IMPACTS; COMPLEX OXIDES; FERROICS; FUNCTIONAL COATING; FUNCTIONAL OXIDE FILMS; IMPROVED SUBSTRATE; METAL-OXIDE; NOBLE METAL ELECTRODES; OPTIMAL CHOICE; PB(ZR , TI)O; PLATINUM BOTTOM ELECTRODES; PROCESS TEMPERATURE; SILICON SUBSTRATES; TEST CASE; WORK OF ADHESION; ZNO;

BARIUM COMPOUNDS; CHEMICAL ANALYSIS; CHEMICAL PROPERTIES; ELECTRIC PROPERTIES; ELECTRODES; ELECTRONIC STRUCTURE; LEAD; OXIDE FILMS; PLATINUM; PLATINUM COMPOUNDS; PRECIOUS METALS; PROTECTIVE COATINGS; THIN FILMS; ZINC OXIDE; ZIRCONIUM;

ADHESION;

EID: 84861810376     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.201103077     Document Type: Article

References (38)

1. H. N. Al-Shareef, D. Dimos, B. A. Tuttle, M. V. Raymond, J. Mater. Res. 1997, 12, 347.
2. S. M. Aygun, J. F. Ihlefeld, W. J. Borland, J. P. Maria, J. Appl. Phys. 2011, 109, 034108.
3. J. F. Ihlefeld, A. M. Vodnick, S. P. Baker, W. J. Borland, J.-P. Maria, J. Appl. Phys. 2008, 103, 074112.
4. S. H. Kim, D. J. Kim, J. P. Maria, A. I. Kingon, S. K. Streiffer, J. Im, O. Auciello, A. R. Krauss, Appl. Phys. Lett. 2000, 76, 496.
5. T. Maeder, L. Sagalowicz, P. Muralt, Jpn. J. Appl. Phys. 1 1998, 37, 2007.
6. G. R. Fox, K. Suu, US Patent 6,682,772 2004.
7. K. Sreenivas, I. Reaney, T. Maeder, N. Setter, C. Jagadish, R. G. Elliman, J. Appl. Phys. 1994, 75, 232.
8. S. Halder, T. Schneller, R. Waser, Appl. Phys. A-Mater. Sci. Process. 2007, 87, 705.
9. D. Sotiropoulou, P. Nikolopoulos, J. Mater. Sci. 1993, 28, 356.
10. D. Chatain, F. Chabert, V. Ghetta, J. Fouletier, J. Am. Ceram. Soc. 1993, 76, 1568.
11. 3, BST, Thin Films on Flexible Copper Foils for Use as a Non-Linear Dielectric, North Carolina State University, Raleigh, NC, USA 2006
12. M. McLean, E. D. Hondros, J. Mater. Sci. 1971, 6, 19.
13. G. R. Fox, S. Trolier-Mckinstry, S. B. Krupanidhi, L. M. Casas, J. Mater. Res. 1995, 10, 1508.
14. G. L. Brennecka, J. F. Ihlefeld, J.-P. Maria, B. A. Tuttle, P. G. Clem, J. Am. Ceram. Soc. 2010, 93, 3935.
15. J. Ihlefeld, B. Laughlin, A. Hunt-Lowery, W. Borland, A. Kingon, J.-P. Maria, J. Electroceram. 2005, 14, 95.
16. K. Nittala, G. L. Brennecka, D. S. Robinson, J. L. Jones, Adv. X-ray Anal. 2011, 54.
17. B. A. Tuttle, T. J. Headley, B. C. Bunker, R. W. Schwartz, T. J. Zender, C. L. Hernandez, D. C. Goodnow, R. J. Tissot, J. Michael, A. H. Carim, J. Mater. Res. 1992, 7, 1876.
18. I. M. Reaney, K. Brooks, R. Klissurska, C. Pawlaczyk, N. Setter, J. Am. Ceram. Soc. 1994, 77, 1209.
19. G. L. Brennecka, C. M. Parish, B. A. Tuttle, L. N. Brewer, M. A. Rodriguez, Adv. Mater. 2008, 20, 1407.
20. T. Lipinsky, J. Schubert, C. Buchal, J. Opt. Soc. Am. B-Opt. Phys. 2005, 22, 913.
21. M. H. Frey, Z. Xu, P. Han, D. A. Payne, Ferroelectrics 1998, 206, 337.
22. S. Hoffmann, R. Waser, J. Eur. Ceram. Soc. 1999, 19, 1339.
23. J. Sigman, G. L. Brennecka, P. G. Clem, B. A. Tuttle, J. Am. Ceram. Soc. 2008, 91, 1851.
24. C. B. Parker, J. P. Maria, A. I. Kingon, Appl. Phys. Lett. 2002, 81, 340.
25. C. M. Parish, G. L. Brennecka, B. A. Tuttle, L. N. Brewer, J. Am. Ceram. Soc. 2008, 91, 3690.
26. A. Etin, G. E. Shter, S. Baltianski, G. S. Grader, G. M. Reisner, J. Am. Ceram. Soc. 2006, 89, 2387.
27. A. Dutschke, J. Meinhardt, D. Sporn, J. Eur. Ceram. Soc. 2004, 24, 1579.
28. K. Amanuma, T. Hase, Y. Miyasaka, Appl. Phys. Lett. 1994, 65, 3140.
29. F. Calame, P. Muralt, Appl. Phys. Lett. 2007, 90, 062907.
30. J. F. Ihlefeld, P. R. Daniels, S. M. Aygun, W. J. Borland, J. P. Maria, J. Mater. Res. 2010, 25, 1064.
31. K. Carl, K. H. Härdtl, Ber. Dtsch. Keram. Ges. 1970, 47, 687.
32. K. Carl, K. H. Härdtl, Phys. Status Solidi A-Appl. Res. 1971, 8, 87.
33. J. F. Ihlefeld, J. P. Maria, unpublished.
34. O. Auciello, A. R. Krauss, J. Im, J. A. Schultz, Annu. Rev. Mater. Sci. 1998, 28, 375.
35. T. Tani, Z. K. Xu, D. A. Payne, in Ferroelectric Thin Films III, Vol. 310 (Eds:, E. R. Myers, B. A. Tuttle, S. B. Desu, P. K. Larsen,), Materials Research Society, Pittsburgh 1992, p. 269.
36. Y. Bastani, N. Bassiri-Gharb, Acta Mater. 2012, 60, 1346.
37. R. A. Assink, R. W. Schwartz, Chem. Mater. 1993, 5, 511.
38. R. W. Schwartz, P. G. Clem, J. A. Voigt, E. R. Byhoff, M. Van Stry, T. J. Headley, N. A. Missert, J. Am. Ceram. Soc. 1999, 82, 2359.