Role of Ti n+ and Al n+ ion irradiation (n=1, 2) during Ti 1-xAl xN alloy film growth in a hybrid HIPIMS/magnetron mode

Surface and Coatings Technology

Volumn 206, Issue 19-20, 2012, Pages 4202-4211

  Greczynski, G ^a   Lu, J ^a   Johansson, M P ^a,b   Jensen, J ^a   Petrov, I ^a,c   Greene, J E ^a,c   Hultman, L ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b SECO TOOLS AB   (Sweden)

^c University of Illinois at Urbana Champaign   (United States)

Author keywords

HIPIMS; HPPMS; Ionized PVD; Sputtering; TiAlN

Indexed keywords

ALN; CO-SPUTTERED FILMS; DC MAGNETRON SPUTTERING; ELASTIC RECOIL DETECTION ANALYSIS; FLUX DISTRIBUTIONS; GROWTH REACTIONS; HIGH HARDNESS; HIGH-POWER; HIPIMS; HPPMS; HYBRID APPROACH; ION ENERGY DISTRIBUTION FUNCTIONS; ION FLUXES; IONIZED PVD; LOW STRESS; LOWER HARDNESS; MASS SPECTROSCOPY; METAL TARGET; ORDERS OF MAGNITUDE; PULSED MAGNETRON SPUTTERING; SCANNING ELECTRONS; SOLUBILITY LIMITS; SUBSTRATE BIAS VOLTAGES; TARGET POWER; TIALN;

ATOMIC FORCE MICROSCOPY; FILM GROWTH; HARDNESS; IONIZATION; IRRADIATION; MAGNETRON SPUTTERING; MASS SPECTROMETRY; METAL IONS; NANOINDENTATION; SCANNING ELECTRON MICROSCOPY; SODIUM CHLORIDE; SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

ALUMINUM;

EID: 84861480318     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.04.024     Document Type: Article

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