In-situ monitoring of pattern filling in nano-imprint lithography using surface plasmon resonance

Journal of Nanoscience and Nanotechnology

Volumn 11, Issue 6, 2011, Pages 5279-5284

  Hocheng, Hong ^a   Hsu, Wei Hsuan ^a   Shy, Jow Tsong ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Filling rate; Imprint lithography; Monitoring; Nanoimprint; Surface plasmon resonance (SPR)

Indexed keywords

ANGLE SHIFTS; DETRIMENTAL EFFECTS; END POINTS; FILLING IN; FILLING RATE; GLASS LAYERS; HIGH REFRACTIVE INDEX; HIGH SENSITIVITY; HIGH THROUGHPUT; IMPRINT LITHOGRAPHY; IMPRINTED POLYMERS; IN-SITU MONITORING; INNOVATIVE METHOD; LOW COSTS; LOW REFRACTIVE INDEX; METAL THIN FILM; MOLD FILLING; MONITORING SYSTEM; NANO-IMPRINT; REFLECTIVITY CHANGES; RESONANCE ANGLE;

FILLING; GLASS; MOLDS; MONITORING; NANOIMPRINT LITHOGRAPHY; REFRACTIVE INDEX;

SURFACE PLASMON RESONANCE;

EID: 84861175710     PISSN: 15334880     EISSN: 15334899     Source Type: Journal    
DOI: 10.1166/jnn.2011.3780     Document Type: Conference Paper

References (15)

1. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Appl. Phys. Lett. 67, 3114 (1995).
2. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Science 272, 85 (1996).
3. M. D. Austin, H. Ge, W. Wu, M. Li, Z. Yu, D. Wasserman, S. A. Lyon, and S. Y. Chou, Appl. Phys. Lett. 84, 5299 (2004).
4. Y. Hirai, S. Yoshida, N. Takagi, Y. Tanaka, H. Yabe, K. Sasaki, H. Sumitani, and K. Yamamoto, Jpn. J. Appl. Phys. 42, 3863 (2003).
5. C. Perret, C. Gourgon, F. Lazzarino, J. Tallal, S. Landis, and R. Pelzer, Microelectron. Eng. 73-74, 172 (2004)
6. S. Landis, N. Chaix, C. Gourgon, C. Perret, and T. Leveder, Nanotechnology 17, 2701 (2006).
7. H. Hocheng and W. H. Hsu, Jpn. J. Appl. Phys. 46, 6370 (2007).
8. H. Hocheng and W. H. Hsu, J. Nanosci. Nanotechnol. 9, 4267 (2009).
9. Q. Xia, Z. Yu, H. Gao, and S. Y. Chou, Appl. Phys. Lett. 89, 073107 (2006).
10. Z. Yu, H. Gao, and S. Y Chou, Nanotechnology 18, 065304 (2007).
11. H. Hocheng and C. C. Nien, Jpn. J. Appl. Phys. 45, 5590 (2006).
12. J. Homola, S. S. Yee, and G. Gauglitz, Sens. Actuator B-Chem. 54, 3 (1999).
13. J. Homola, Surface Plasmon Resonance Based Sensors, Springer, Berlin (2006).
14. B.-K. Oh, Y.-K. Kim, W. Lee, Y. M. Bae, W. H. Lee, and J.-W. Choi, Biosens. Bioelectron. 18, 605 (2003).
15. W. Lee, D.-B. Lee, B.-K. Oh, W. H. Lee, and J.-W. Choi, Enzyme Microb. Technol. 35, 678 (2004).