In-situ monitoring of cavity filling in nanoimprints by capacitance

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 6 B, 2006, Pages 5590-5596

  Hocheng, Hong ^a   Nien, Chin Chung ^a,b  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Capacitance; Cavity filling; Finite element method; Monitoring; Nanoimprint

Indexed keywords

CAPACITANCE MEASUREMENT; COMPUTER SIMULATION; FINITE ELEMENT METHOD; MONITORING; NUMERICAL ANALYSIS; POLYMERS;

CAVITY FILLING; NANOIMPRINT;

NANOSTRUCTURED MATERIALS;

EID: 33745669460     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.5590     Document Type: Review

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