Effect of back mold grooves on improving uniformity in nanoimprint lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 9 B, 2007, Pages 6370-6372

  Hocheng, Hong ^a   Hsu, Wei Hsuan ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Aspect ratio; Grooves; Imprint lithography; Nanoimprint; Uniformity

Indexed keywords

ASPECT RATIO; DEFORMATION; SUBSTRATES;

IMPRINT LITHOGRAPHY; MOLD DEFORMATION;

NANOIMPRINT LITHOGRAPHY;

DEFORMATION; LITHOGRAPHY; SUBSTRATES;

EID: 34648815919     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.6370     Document Type: Article

References (7)

1. S. Y. Chou, P. R. krauss, and P. J. Renstrom: Appl. Phys. Lett. 67 (1995) 3114.
2. S. Y. Chou and P. R. krauss: Microelectron. Eng. 35 (1997) 237.
3. Y. Hirai, T. Konishi, T. Kanakugi, H. Kawata, and H. Kikuta: Proc. SPIE 5515 (2004) 187.
4. C. Gourgon, C Perret, J. Tallal, F. Lazzarino, S. Landis, and O. Joubert: J. Phys. D 38 (2005) 70.
5. F. Lazzarino, C. Gourgon, P. Schiavone, and C Perret: J. Vac. Sci. Technol. B 22 (2004) 3318.
6. C. Gourgon, C. Perret, G. Micouin, F. Lazzarino, J. H. Tortai, O. Joubert, and J.-P. E. Grolier: J. Vac. Sci. Technol. B 21 (2003) 98.
7. C Perret, C. Gourgon, F. Lazzarino, J. Tallal, S. Landis, and R. Pelzer: Microelectron. Eng. 73-74 (2004) 172.