Chemical vapor deposition of hexagonal boron nitride

e-Journal of Surface Science and Nanotechnology

Volumn 10, Issue , 2012, Pages 133-138

  Suzuki, Satoru ^a   Hibino, Hiroki ^a  

^a NTT Basic Research Laboratories   (Japan)

Author keywords

Boron nitride; Chemical vapor deposition; Polycrystalline thin films

Indexed keywords

BORON NITRIDE; GRAIN BOUNDARIES; GRAIN GROWTH; III-V SEMICONDUCTORS; NITRIDES; NITROGEN; SUBSTRATES; THIN FILMS;

GRAPHENE GROWTH; HEXAGONAL BORON NITRIDE; NI SUBSTRATES; NITROGEN ATOM; POLYCRYSTALLINE; POLYCRYSTALLINE THIN FILM; SUBSTRATE MATERIAL; THERMAL CHEMICAL VAPOR DEPOSITION;

CHEMICAL VAPOR DEPOSITION;

EID: 84861110203     PISSN: None     EISSN: 13480391     Source Type: Journal    
DOI: 10.1380/ejssnt.2012.133     Document Type: Conference Paper

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