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Materials Science and Engineering: B

Volumn 177, Issue 2, 2012, Pages 233-238

Chemical vapor deposition of boron- and nitrogen-containing graphene thin films

(2) Suzuki, Satoru a Hibino, Hiroki a

a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories (Japan)

Author keywords

CVD; Graphene; h BN; Polycrystalline Ni substrates

Indexed keywords

BORON NITRIDE; CARRIER CONCENTRATION; CHEMICAL VAPOR DEPOSITION; III-V SEMICONDUCTORS; NICKEL; NITROGEN; THIN FILMS;

BAND SHIFT; BORON ATOM; CHEMICAL VAPOUR DEPOSITION; H-BN; NITROGEN ATOM; POLYCRYSTALLINE NI SUBSTRATES; THERMAL CHEMICAL VAPOR DEPOSITION; THIN-FILMS; TOTAL CONTENT;

GRAPHENE;

EID: 84855803949 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/j.mseb.2011.10.001 Document Type: Article

Times cited : (25)

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