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Vacuum

Volumn 84, Issue 5, 2009, Pages 642-647

Effects of nitrogen gas ratio on composition and microstructure of BCN films prepared by RF magnetron sputtering

(5) Nakao, Setsuo a Sonoda, Tsutomu a Tsugawa, Kazuo a Choi, Junho b Kato, Takahisa b

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

b UNIVERSITY OF TOKYO (Japan)

Author keywords

BCN films; FT IR; Hardness; Raman; RF magnetron sputter; XPS

Indexed keywords

AMORPHOUS STRUCTURES; BCN FILMS; BOND FORMATION; NANOINDENTATION TESTS; NITROGEN GAS; RADIO FREQUENCY MAGNETRON SPUTTERING; RAMAN MEASUREMENTS; RF MAGNETRONS; RF-MAGNETRON SPUTTERING; SCANNING ELECTRONS; SEM/EDX; STRUCTURAL CHANGE; ULTRA-VIOLET; XPS;

BORON CARBIDE; FIELD EMISSION; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAPHITE; HARDNESS; MAGNETRON SPUTTERING; MAGNETRONS; MECHANICAL PROPERTIES; MICROSTRUCTURE; RAMAN SPECTROSCOPY; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY; X RAY SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 70649089450 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/j.vacuum.2009.06.012 Document Type: Article

Times cited : (20)

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