SCOPUS 정보 검색 플랫폼

Volumn 45, Issue 6 B, 2006, Pages 5354-5358

Newly developed resolution enhancement lithography assisted by chemical shrink process and materials for next-generation devices

Author keywords

Chemically amplified resist; Pattern shrink technology; RELACS

Indexed keywords

BOUNDARY LAYERS; CROSSLINKING; ETCHING; SHRINKAGE; THIN FILMS; WATER;

ARF LITHOGRAPHY; CHEMICALLY AMPLIFIED RESIST; PATTERN SHRINK TECHNOLOGY; RESOLUTION ENHANCEMENT LITHOGRAPHY ASSISTED BY CHEMICAL SHRINK (RELACS);

LITHOGRAPHY;

EID: 33745657852 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.45.5354 Document Type: Review

Times cited : (7)

References (9)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.