메뉴 건너뛰기




Volumn 6521, Issue , 2007, Pages

Model-assisted routing for improved lithography robustness

Author keywords

DFM; Layout; Lithography; Routing

Indexed keywords

COMPUTATION THEORY; DESIGN AIDS; INTEGRATED CIRCUIT LAYOUT; NETWORK ROUTING; ROBUSTNESS (CONTROL SYSTEMS);

EID: 35148880265     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.717055     Document Type: Conference Paper
Times cited : (20)

References (6)
  • 4
    • 4444331730 scopus 로고    scopus 로고
    • Optical proximity correction (OPC)-friendly maze routing
    • pp, San Diego, California
    • L.-D. Huang and M. D. F. Wong, "Optical proximity correction (OPC)-friendly maze routing," pp. 186-191, Design Automation Conference, (San Diego, California), 2004.
    • (2004) Design Automation Conference , pp. 186-191
    • Huang, L.-D.1    Wong, M.D.F.2
  • 5
    • 27944510181 scopus 로고    scopus 로고
    • RADAR: RET-Aware detailed routing using fast lithography simulations
    • pp, Anaheim, California
    • J. Mitra, P. Yu, and D. Z. Pan, "RADAR: RET-Aware detailed routing using fast lithography simulations," pp. 369-372, Design Automation Conference, (Anaheim, California), 2005.
    • (2005) Design Automation Conference , pp. 369-372
    • Mitra, J.1    Yu, P.2    Pan, D.Z.3
  • 6
    • 35148878534 scopus 로고    scopus 로고
    • BlastFusion/QuartzDRC, Magma Design Automation, Inc
    • BlastFusion/QuartzDRC, Magma Design Automation, Inc.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.