Thin hardmask patterning stacks for the 22-nm node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7274, Issue , 2009, Pages

  Zhu, Zhimin ^a   Piscani, Emil ^b   Wang, Yubao ^a   Macie, Jan ^a   Neef, Charles J ^a   Smith, Brian ^a  

^a BREWER SCIENCE INC   (United States)

^b SEMATECH   (United States)

Author keywords

Double patterning (DP); Foot exposure (FE); Thin resist; Thin spin on silicon hardmask; Top exposure (TE); UV distribution

Indexed keywords

DOUBLE PATTERNING (DP); FOOT EXPOSURE (FE); THIN RESIST; THIN SPIN-ON SILICON HARDMASK; UV DISTRIBUTION;

DYNAMIC POSITIONING; LIGHT; PERCOLATION (SOLID STATE); SPIN DYNAMICS;

LITHOGRAPHY;

EID: 65849104347     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813816     Document Type: Conference Paper

References (3)

1. Weimer, M., Wang, Y., Neef, CJ., Claypool, J., Edwards, K., and Zhu, Z., "Materials and performance of multilayer lithographic schemes," Proceedings of SPIE, vol.6519, 65192S-1 - 65192S-8 (2007).
2. Zhimin, Z., Emil, P., Kevin, E., and Brian S., "Reflection control in hyper-NA immersion lithography," Proceedings of SPIE, vol.6924, 2008, pp. 69244A-1 - 69244A-7.
3. Brewer, T., Carlson, R., and Arnold, J., "The Reduction of the Standing-Wave Effect in Positive Photoresists," Journal of Applied Photographic Engineering, vol.7, no. 6, 184-186 (1981).