Deposition of c-axis orientation aluminum nitride films on flexible polymer substrates by reactive direct-current magnetron sputtering

Thin Solid Films

Volumn 520, Issue 15, 2012, Pages 4863-4870

  Jin, H ^a   Zhou, J ^a   Dong, S R ^a   Feng, B ^a   Luo, J K ^a,b   Wang, D M ^a   Milne, W I ^c,d   Yang, C Y ^e  

^a ZHEJIANG UNIVERSITY   (China)

^b UNIVERSITY OF BOLTON   (United Kingdom)

^c UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^d Kyung Hee University   (South Korea)

^e Department of Computer Science and Engineering   (United States)

Author keywords

Aluminum nitride; c Axis orientation; Polymer substrates; Reactive magnetron sputtering; Thin films

Indexed keywords

ALN; ALN THIN FILMS; ALUMINUM NITRIDE FILMS; C-AXIS ORIENTATIONS; COLUMNAR STRUCTURES; DEPOSITION PARAMETERS; DEPOSITION PRESSURES; DIRECT-CURRENT MAGNETRON SPUTTERING; FLEXIBLE POLYMER SUBSTRATES; FLOW RATIOS; LAB-ON-CHIP SYSTEMS; PIEZOELECTRIC THIN FILMS; POLYMER SUBSTRATE; REACTIVE MAGNETRON SPUTTERING; SPUTTERING POWER; SPUTTERING PRESSURES; UNDERLAYERS;

ALUMINUM NITRIDE; CRYSTALLOGRAPHY; DEPOSITION; MAGNETRON SPUTTERING; OPTIMIZATION; POLYMER FILMS; POLYMERS; SUBSTRATES; THIN FILMS;

VAPOR DEPOSITION;

EID: 84860268783     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.03.015     Document Type: Article

References (26)

1. T. Hanada, T. Negishi, I. Shiroishi, and T. Shiro Thin Solid Films 518 2010 3089
2. K.A. Sierros, D.R. Cairns, J.S. Abell, and S.N. Kukureka Thin Solid Films 518 2010 2623
3. J.S. Cho, S. Baek, and J.C. Lee Sol. Energy Mater. Sol. Cells 95 2011 1852
4. Y.-Y. Yu, W.-C. Chien, C.-Y. Ciou, and H.-C. Wu Thin Solid Films 519 2011 4721
5. E. Zampetti, L. Maiolo, A. Pecora, F. Maita, S. Pantalei, A. Minotti, A. Valletta, M. Cuscunà, A. Macagnano, G. Fortunato, and A. Bearzotti Sens. Actuators B 155 2011 768
6. F.-Y. Chang, R.-H. Wang, H. Yang, Y.-H. Lin, T.-M. Chen, and S.-J. Huang Thin Solid Films 518 2010 7343
7. K.-H. Cho, M.-G. Kang, S.-M. Oh, C.-Y. Kang, Y. Lee, and S.-J. Yoon Thin Solid Films 518 2010 6277
8. L. Sun, G. Qin, H. Huang, H. Zhou, N. Behdad, W. Zhou, and Z. Ma Appl. Phys. Lett. 96 2010 013509
9. D. Zhao, D.A. Mourey, and T.N. Jackson IEEE Electron Device Lett. 31 2010 323
10. S.Y. Xiao, L.F. Che, X.X. Li, and Y.L. Wang Microelectron. Eng. 85 2008 452
11. T. Lemke, G. Biancuzzi, H. Feth, J. Huber, F. Goldschmidtboing, and P. Woias Sens. Actuators A 168 2011 213
12. E.J. Geiger, A.P. Pisano, and F. Svec J. Microelectromech. Syst. 19 2010 944
13. M. Akiyama, Y. Morofuji, T. Kamohara, K. Nishikubo, Y. Ooishi, M. Tsubai, O. Fukuda, and N. Ueno Adv. Funct. Mater. 17 2007 458
14. M. Akiyama, Y. Morofuji, K. Nishikubo, and T. Kamohara Appl. Phys. Lett. 92 2008 043509
15. N. Bu, O. Fukuda, N. Ueno, and M. Inoue IEEE International Conference on Robotics and Biomimetics 2009 IEEE New York 944
16. S. Petroni, C.L. Tegola, G. Caretto, A. Campa, A. Passaseo, M.D. Vittorio, and R. Cingolani Microelectron. Eng. 88 2011 2372
17. G.F. Iriarte, J.G. Rodriguez, and F. Calle Mater. Res. Bull. 45 2010 1039
18. W.T. Lim, B.K. Son, D.H. Kang, and C.H. Lee Thin Solid Films 382 2001 56
19. A. Ababneh, U. Schmid, J. Hernando, J.L. Sánchez-Rojas, and H. Seidel Mater. Sci. Eng. B Adv. 172 2010 253
20. H. Seo, I. Petrov, and K. Kim J. Electron. Mater. 39 2010 1146
21. J. Bjurstrom, D. Rosen, I. Katardjiev, V.M. Yanchev, and I. Petrov IEEE Trans. Ultrason. Ferroelectr. Freq. Control 51 2004 1347
22. C.L. Huang, K.W. Tay, and L. Wu Solid State Electron. 49 2005 219
23. S. Berg, and T. Nyberg Thin Solid Films 476 2005 215
24. K.H. Chiu, J.H. Chen, H.R. Chen, and R.S. Huang Thin Solid Films 515 2007 4819
25. M. Ohring Materials Science of Thin Films 2001 Second edition Academic Press
26. H. Cheng, Y. Sun, and P. Hing Thin Solid Films 434 2003 112