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Volumn 258, Issue 17, 2012, Pages 6436-6440
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A combination of electroless and electrochemical etching methods for enhancing the uniformity of porous silicon substrate for light detection application
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Author keywords
Electrochemical anodization; FTIR; MSM photodetectors; Porous silicon; Raman spectroscopy
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Indexed keywords
ELECTROCHEMICAL ETCHING;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
PHOTODETECTORS;
PHOTONS;
RAMAN SPECTROSCOPY;
SUBSTRATES;
CRYSTALLINE SILICONS;
ELECTRO-CHEMICAL ANODIZATION;
FTIR;
MSM PHOTODETECTOR;
PHOTOLUMINESCENT MATERIALS;
POROUS SILICON SUBSTRATES;
PULSED ELECTROCHEMICAL ETCHINGS;
WAVELENGTH EMISSION;
POROUS SILICON;
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EID: 84860237996
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/j.apsusc.2012.03.056 Document Type: Article |
Times cited : (39)
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References (19)
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