Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks

Optics Express

Volumn 18, Issue 14, 2010, Pages 14467-14473

  Brizuela, Fernando ^a,b   Carbajo, Sergio ^a,b   Sakdinawat, Anne ^a,c   Alessi, David ^a,b   Martz, Dale H ^a,b   Wang, Yong ^a,b   Luther, Bradley ^a,b   Goldberg, Kenneth A ^c   Mochi, Iacopo ^c   Attwood, David T ^a,c   Fontaine, Bruno La ^d   Rocca, Jorge J ^a,b   Menoni, Carmen S ^a,b  

^a Department of Environmental and Radiological Health Sciences   (United States)

^b Engineering Research Center and Hydraulics Laboratory   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^d IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; MASKS; MICROSCOPES; ROUGHNESS MEASUREMENT; ULTRAVIOLET LASERS;

AERIAL IMAGES; AERIAL IMAGING; DEFECT PRINTABILITY; EXTREME ULTRAVIOLET LASERS; EXTREME ULTRAVIOLET LITHOGRAPHY MASKS; HIGH VOLUME MANUFACTURING; IMAGING CONDITIONS; LITHOGRAPHIC MASK;

ANTENNAS;

EID: 84859401981     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.014467     Document Type: Article

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