A study of the colloidal stability of mixed abrasive slurries and their role in CMP

Journal of the Electrochemical Society

Volumn 159, Issue 5, 2012, Pages

  Lin, F ^a   Nolan, L ^a   Xu, Z ^a   Cadien, K ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

COLLOIDAL STABILITY; COMPOSITE PARTICLES; EXPERIMENTAL ANALYSIS; MIXED ABRASIVE SLURRIES; POLISH RATE; SELF-ASSEMBLED; SILICA CORES; SIMPLE APPROACH;

CERIUM COMPOUNDS; CHEMICAL MECHANICAL POLISHING; MATHEMATICAL MODELS; SILICA; SILICON COMPOUNDS; SILICON OXIDES;

COMPOSITE MATERIALS;

EID: 84859337808     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/2.jes113470     Document Type: Article

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