SCOPUS 정보 검색 플랫폼

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 7 A, 2002, Pages 4509-4512

The stability of nano fumed silica particles and its influence on chemical mechanical planarization for interlayer dielectrics

(5) Kim, Jongphil a Paik, Ungyu b Jung, Yeon Gil a Katoh, Takeo a Park, Jea Gun b

a Hanyang University (South Korea)

b Changwon National University (South Korea)

Author keywords

CMP; Dispersion; ILD; PVP; Removal rate; Silica; Uniformity

Indexed keywords

ADSORPTION; CORROSION; DIELECTRIC MATERIALS; DISPERSIONS; PLASMAS; SILICA; SPECTROSCOPY; SURFACE TREATMENT; VINYL RESINS;

CHEMICAL MECHANICAL PLANARIZATION; INDUCTIVELY COUPLED PLASMA ATOMIC EMISSION SPECTROSCOPY; INTERLAYER DIELECTRICS; PLASMA ENHANCED TETRAETHLYORTHOSILICATE; SURFACE POTENTIAL;

NANOSTRUCTURED MATERIALS;

EID: 0036655921 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.41.4509 Document Type: Article

Times cited : (13)

References (18)

1
- 0004165928
- (Mcgraw-Hill)
- (1996) ULSI Technology
- Chang, C.Y.¹ Sze, S.M.²

2
- 0032655148
- (1999) J. Electrochem. Soc. , vol.146 , pp. 1984
- Lin, C.F.¹ Tseng, W.T.² Feng, M.S.³

3
- 0002227337
- (1992) Solid State Technol. , vol.35 , Issue.5 , pp. 87
- Sivaram, S.¹ Bath, H.² Leggeti, R.³ Maury, A.⁴ Monnig, K.⁵ Tolles, R.⁶

4
- 0003508875
- (John Wiley & Sons)
- (1997) Chemical Mechanical Planarization of Microelectronic Materials
- Stiegerwald, J.M.¹ Murarka, S.P.² Gutmann, R.J.³

5
- 0031186658
- (1997) Solid-State Electron. , vol.41 , pp. 1005
- Homma, Y.¹ Furusawa, T.² Morishima, H.³ Sato, H.⁴

6
- 0033640176
- (2000) Microelectron. Eng. , vol.50 , pp. 41
- Van Den Velden, P.¹

7
- 0010316789
- Dr. Thesis, Rensselaer Polytechnic Institute, U.S.A.
- (1995)
- Stiegerwald, J.M.¹

8
- 0035880327
- (2001) Jpn. J. Appl. Phys. , vol.40
- Park, J.-G.¹ Katoh, T.² Yoo, H.-C.³ Park, J.-H.⁴

9
- 0007308130
- (December)
- (1995) Solid State Technol. , pp. 65
- Pye, J.T.¹ Fry, H.W.² Schaffer, W.J.³

10
- 0034051002
- (2000) J. Colloid Interface Sci. , vol.223 , pp. 102
- Palla, B.J.¹ Shah, D.O.²

11
- 0010315776
- (October)
- (1994) Solid State Technol.
- Ali, I.¹

13
- 0030562719
- (1996) J. Non-Cryst. Solids , vol.196 , pp. 51
- Sjöberg, S.¹

14
- 0018302032
- (John Wiley & Sons)
- (1979) The Chemistry of Silica
- Iler, R.K.¹

15
- 0033342413
- (1999) J. Non-Cryst. Solids , vol.260 , pp. 21
- Okunev, A.G.¹ Shaurman, S.A.² Danilyuk, A.F.³ Aristov, Y.I.⁴ Bergeret, G.⁵ Renouprez, A.⁶

16
- 0001897545
- eds. V. A. Hackley and U. Paik (American Ceramic Society)
- (1998) Ultrasonic and Dielectric Characterization Techniques for Suspended Particulates , pp. 191
- Hackley, V.A.¹ Texter, J.²

17
- 0032641086
- (1999) J. Am. Ceram. Soc. , vol.82 , pp. 833
- Paik, U.¹ Hackley, V.A.² Lee, H.W.³

18
- 0031189557
- (1997) J. Am. Ceram. Soc. , vol.80 , pp. 1781
- Hackley, V.A.¹ Paik, U.² Kim, B.H.³ Malghan, S.G.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.