Effects of mixed abrasives in chemical mechanical polishing of oxide films

Journal of Materials Research

Volumn 18, Issue 10, 2003, Pages 2323-2330

  Lu, Zhenyu ^a   Lee, Seung Ho ^a,b   Gorantla, Venkata R K ^a   Babu, S V ^a   Matijević, Egon ^a  

^a CLARKSON UNIVERSITY   (United States)

^b Korea Institute of Ceramic Engineering and Technology (KICET)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ABRASIVES; MIXING; NANOSTRUCTURED MATERIALS; PARTICLE SIZE ANALYSIS; SILICON WAFERS; SURFACE PROPERTIES; THIN FILMS;

FLAT SURFACES;

CHEMICAL MECHANICAL POLISHING;

EID: 0242408434     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2003.0326     Document Type: Article

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