Wafer-scale fabrication of high-aspect ratio nanochannels based on edge-lithography technique

Biomicrofluidics

Volumn 6, Issue 1, 2012, Pages

  Xie, Quan ^a,b   Zhou, Qing ^c,d   Xie, Fei ^a   Sang, Jianming ^c   Wang, Wei ^a   Zhang, Haixia Alice ^a   Wu, Wengang ^a   Li, Zhihong ^a  

^a PEKING UNIVERSITY   (China)

^b UNIVERSITY OF MICHIGAN   (United States)

^c PEKING UNIVERSITY HEALTH SCIENCE CENTER   (China)

^d University of California Davis   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; LITHOGRAPHY; REACTIVE ION ETCHING; SILICON WAFERS; WSI CIRCUITS;

ALUMINUM FILM; DEEP REACTIVE ION ETCHING; EDGE LITHOGRAPHY; HIGH ASPECT RATIO; MICROFLUIDIC CHIP; NANO CHANNELS; NONUNIFORMITY; WAFER SCALE FABRICATION;

ASPECT RATIO;

EID: 84859329902     PISSN: 19321058     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3683164     Document Type: Article

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