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Volumn 5, Issue 2, 2011, Pages

Capillary flow in sacrificially etched nanochannels

Author keywords

[No Author keywords available]

Indexed keywords

CONTINUUM MECHANICS; ROLLING RESISTANCE;

EID: 79959910726     PISSN: 19321058     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3602858     Document Type: Article
Times cited : (23)

References (15)
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    • Abgrall P. Nguyen N.T. Anal. Chem. 2008, 80:2326. ANCHAM, 0003-2700, 10.1021/ac702296u, and.
    • (2008) Anal. Chem. , vol.80 , pp. 2326
    • Abgrall, P.1    Nguyen, N.T.2
  • 2
    • 43649092174 scopus 로고    scopus 로고
    • TRBIDM, 0167-7799, 10.1016/j.tibtech.2008.02.009
    • Fu J. Mao P. Han J. Trends Biotechnol. 2008, 26:311. TRBIDM, 0167-7799, 10.1016/j.tibtech.2008.02.009, and.
    • (2008) Trends Biotechnol. , vol.26 , pp. 311
    • Fu, J.1    Mao, P.2    Han, J.3
  • 5
  • 9
    • 77649206187 scopus 로고    scopus 로고
    • MNIAAR, 1613-4982, 10.1007/s10404-009-0516-4
    • Zhu Y. Petkovic-Duran K. Microfluid. Nanofluid. 2010, 8:275. MNIAAR, 1613-4982, 10.1007/s10404-009-0516-4, and.
    • (2010) Microfluid. Nanofluid. , vol.8 , pp. 275
    • Zhu, Y.1    Petkovic-Duran, K.2
  • 11
    • 33645809573 scopus 로고    scopus 로고
    • MNIAAR, 1613-4982, 10.1007/s10404-005-0068-1
    • Perry J.L. Kandlikar S.G. Microfluid. Nanofluid. 2006, 2:185. MNIAAR, 1613-4982, 10.1007/s10404-005-0068-1, and.
    • (2006) Microfluid. Nanofluid. , vol.2 , pp. 185
    • Perry, J.L.1    Kandlikar, S.G.2
  • 12
    • 34548193292 scopus 로고
    • PHRVAO, 0031-899X, 10.1103/PhysRev.17.273.
    • Washburn E.W. Phys. Rev. 1921, 17:273. PHRVAO, 0031-899X, 10.1103/PhysRev.17.273.
    • (1921) Phys. Rev. , vol.17 , pp. 273
    • Washburn, E.W.1
  • 13
    • 50249110256 scopus 로고    scopus 로고
    • ARMRCU, 1531-7331, 10.1146/annurev.matsci.38.060407.130231
    • Ralston J. Popescu M. Sedev R. Annu. Rev. Mater. Res. 2008, 38:23. ARMRCU, 1531-7331, 10.1146/annurev.matsci.38.060407.130231, and.
    • (2008) Annu. Rev. Mater. Res. , vol.38 , pp. 23
    • Ralston, J.1    Popescu, M.2    Sedev, R.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.