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Volumn 85, Issue 11, 2012, Pages

Producing ripple topographies by ion bombardment with codeposition of impurities: A curvature-dependent sputter yield is not required

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EID: 84858661727     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.85.115419     Document Type: Article
Times cited : (32)

References (32)
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