Sputtering rate measurements of some transition metal suicides and comparison with those of the elements

Surface and Interface Analysis

Volumn 36, Issue 8, 2004, Pages 801-804

  Yoshitake, Michiko ^a   Yamauchi, Yasuhiro ^a   Bose, Chandra ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Argon ion; Crater depth; Silicides; Sputtering yield

Indexed keywords

ARGON IONS; CRATER DEPTHS; SILICIDES; SPUTTERING YIELDS;

ARGON; CRYSTAL STRUCTURE; CURRENT DENSITY; DEPOSITION; ELECTRONIC EQUIPMENT; ION BEAMS; SILICON COMPOUNDS; SPUTTERING; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

TRANSITION METALS;

EID: 4444341238     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1768     Document Type: Conference Paper

References (4)

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4. Suzuki M, Mogi M, Ando H. J. Surf. Anal. 1999; 5:188.