Self-assembly of octadecyltrichlorosilane: Surface structures formed using different protocols of particle lithography

Beilstein Journal of Nanotechnology

Volumn 3, Issue 1, 2012, Pages 114-122

  Saner, ChaMarra K ^a   Lusker, Kathie L ^a   LeJeune, Zorabel M ^a   Serem, Wilson K ^a   Garno, Jayne C ^a  

^a LOUISIANA STATE UNIVERSITY   (United States)

Author keywords

Atomic force microscopy; Nanopatterning; Nanostructures; Octadecyltrichlorosilane; Particle lithography; Self assembled monolayer; Self assembly

Indexed keywords

AFM; ATOMIC FORCE MICROSCOPIES (AFM); CONTACT PRINTING; DIFFERENT PROTOCOLS; DIFFERENT SHAPES; HIGH-THROUGHPUT; MOLECULAR LEVELS; NANO PATTERN; NANODOTS; NANOPATTERNING; OCTADECYLTRICHLOROSILANE; ORGANOSILANE SELF-ASSEMBLED MONOLAYERS; PARTICLE LITHOGRAPHY; PHYSICAL APPROACHES; ROLE OF WATER; SI (1 1 1); SILANATION; SURFACE COVERAGES; SURFACE-BASED;

ATOMIC FORCE MICROSCOPY; NANOSTRUCTURES; ORGANIC POLYMERS; SELF ASSEMBLED MONOLAYERS; SELF ASSEMBLY; SILICON; THICKNESS MEASUREMENT;

LITHOGRAPHY;

EID: 84858404649     PISSN: None     EISSN: 21904286     Source Type: Journal    
DOI: 10.3762/bjnano.3.12     Document Type: Article

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