Local doping of silicon using nanoimprint lithography and molecular monolayers

Advanced Materials

Volumn 23, Issue 11, 2011, Pages 1346-1350

  Voorthuijzen, W Pim ^a   Yilmaz, M Deniz ^a   Naber, Wouter J M ^a   Huskens, Jurriaan ^a   Van Der Wiel, Wilfred G ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

molecular monolayers; nanoimprint lithography; patterning; semiconductor doping

Indexed keywords

BULK SILICON; CAPPING LAYER; DOPANT ATOMS; ELECTRON BEAM EVAPORATION; MICROMETER-SCALE; MOLECULAR MONOLAYER; MOLECULAR PRECURSOR; PATTERNING; SI(1 0 0);

ELECTRON BEAMS; ELECTRON ENERGY LEVELS; MONOLAYERS; PHOSPHORUS; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; SEMICONDUCTOR DOPING; SILICON COMPOUNDS; SILICON OXIDES; THERMAL EVAPORATION;

NANOIMPRINT LITHOGRAPHY;

NANOMATERIAL; PHOSPHORUS; SILICON DIOXIDE;

ARTICLE; CHEMISTRY; SEMICONDUCTOR;

NANOSTRUCTURES; PHOSPHORUS; SEMICONDUCTORS; SILICON DIOXIDE;

EID: 79952644952     PISSN: 09359648     EISSN: 15214095     Source Type: Journal    
DOI: 10.1002/adma.201003625     Document Type: Article

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