Reliable fabrication of 3nm gaps between nanoelectrodes by electron-beam lithography

Nanotechnology

Volumn 23, Issue 12, 2012, Pages

  Manheller, Marcel ^a   Trellenkamp, Stefan ^a   Waser, Rainer ^a,b   Karthäuser, Silvia ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION ROUTES; GAP SIZE; NANO METER RANGE; NANO-ELECTRODES; NANO-METER SCALE; NANOELECTRODE; NANOELECTRONIC DEVICES; PATTERN DESIGNS; PROXIMITY EFFECTS; RESIST SYSTEMS; STRUCTURAL CONTROL; TWO LAYERS;

STRUCTURAL DYNAMICS;

FABRICATION;

EID: 84858377641     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/23/12/125302     Document Type: Article

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