Towards 2-10 nm electron-beam lithography: A quantitative approach

Microelectronic Engineering

Volumn 85, Issue 5-6, 2008, Pages 805-809

  Sidorkin, V ^a   van Run, A ^a   van Langen Suurling, A ^a   Grigorescu, A ^b   van der Drift, E ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Beam spot size; Focus optimization; Resist resolution

Indexed keywords

FOCUSED ION BEAMS; SIZE DETERMINATION;

BEAM SPOT SIZE; FOCUS OPTIMIZATION; RESIST RESOLUTION;

ELECTRON BEAM LITHOGRAPHY;

EID: 44149100065     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.01.024     Document Type: Article

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