Vertically oriented sub-10-nm plasmonic nanogap arrays

Nano Letters

Volumn 10, Issue 6, 2010, Pages 2231-2236

  Im, Hyungsoon ^a   Bantz, Kyle C ^a   Lindquist, Nathan C ^a   Haynes, Christy L ^a   Oh, Sang Hyun ^a  

^a University of Minnesota   (United States)

Author keywords

Atomic layer deposition; Nanogap; Plasmonics; Surface plasmon; Surface enhanced Raman scattering

Indexed keywords

COLLECTIVE EXCITATIONS; CONDUCTION ELECTRONS; ELECTROMAGNETIC ENERGY; FABRICATION TECHNIQUE; GAP SIZE; HIGH DENSITY; HIGH-THROUGHPUT; LIGHT-MATTER INTERACTIONS; METAL STRUCTURES; NANO-GAP; NANOGAPS; NANOMETRICS; NOBLE METALS; OPTICAL LITHOGRAPHY; PLASMONICS; PRECISE CONTROL; SACRIFICIAL LAYER; SERS ENHANCEMENT; SUB-WAVELENGTH LOCALIZATION; SURFACE ENHANCED RAMAN SCATTERING; SURFACE PLASMONS; ULTRA-THIN;

ATOMIC LAYER DEPOSITION; ATOMS; ELECTROMAGNETIC WAVES; NANOPHOTONICS; OPTICAL DATA STORAGE; PHOTOLITHOGRAPHY; PRECIOUS METALS; RAMAN SCATTERING; SCATTERING; SURFACES;

PLASMONS;

EID: 77953320762     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl1012085     Document Type: Article

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