-
1
-
-
0032069546
-
-
10.1007/s003390050709
-
J. L. Liu, Y. Lu, Y. Shi, S. L. Gu, R. L. Jiang, F. Wang, and Y. D. Zheng, Appl. Phys. A 66, 539 (1998). 10.1007/s003390050709
-
(1998)
Appl. Phys. A
, vol.66
, pp. 539
-
-
Liu, J.L.1
Lu, Y.2
Shi, Y.3
Gu, S.L.4
Jiang, R.L.5
Wang, F.6
Zheng, Y.D.7
-
2
-
-
0038161696
-
-
10.1021/nl025875l
-
Y. Cui, Z. Zhong, D. Wang, W. U. Wang, and C. M. Lieber, Nano Lett. 3, 149 (1982). 10.1021/nl025875l
-
(1982)
Nano Lett.
, vol.3
, pp. 149
-
-
Cui, Y.1
Zhong, Z.2
Wang, D.3
Wang, W.U.4
Lieber, C.M.5
-
3
-
-
84857398349
-
-
International Technology Roadmafor Semiconductors
-
See http://www.itrs.net/for International Technology Roadmap for Semiconductors.
-
-
-
-
4
-
-
78649320952
-
-
10.1016/j.mser.2010.07.002
-
C. Ronning, C. Borschel, S. Geburt, and R. Niepelt, Mater. Sci. Eng. R. 70, 30 (2010). 10.1016/j.mser.2010.07.002
-
(2010)
Mater. Sci. Eng. R.
, vol.70
, pp. 30
-
-
Ronning, C.1
Borschel, C.2
Geburt, S.3
Niepelt, R.4
-
5
-
-
33749350786
-
Atomistic modeling of dopant implantation, diffusion, and activation
-
DOI 10.1116/1.2348726
-
L. Pelaz, M. Aboy, P. López, and L. A. Marqués, J. Vac. Sci. Technol. B 24, 2432 (2006). 10.1116/1.2348726 (Pubitemid 44496235)
-
(2006)
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
, vol.24
, Issue.5
, pp. 2432-2436
-
-
Pelaz, L.1
Aboy, M.2
Lopez, P.3
Marques, L.A.4
-
6
-
-
56949090685
-
-
10.1016/j.mseb.2008.08.018
-
P. F. Fazzini, F. Cristiano, C. Dupr, S. Paul, T. Ernst, H. Kheyrandish, K. K. Bourdelle, and W. Lerch, Mater. Sci. Eng. B 154-155, 256 (2008). 10.1016/j.mseb.2008.08.018
-
(2008)
Mater. Sci. Eng. B
, vol.154-155
, pp. 256
-
-
Fazzini, P.F.1
Cristiano, F.2
Dupr, C.3
Paul, S.4
Ernst, T.5
Kheyrandish, H.6
Bourdelle, K.K.7
Lerch, W.8
-
8
-
-
33847741771
-
A study of trench-edge defect formation in (001) and (011) silicon recrystallized by solid phase epitaxy
-
DOI 10.1063/1.2426924
-
K. L. Saenger, J. P. de Souza, K. E. Fogel, J. A. Ott, C. Y. Sung, D. K. Sadana, and H. Yin, J. Appl. Phys. 101, 024908 (2007). 10.1063/1.2426924 (Pubitemid 46372880)
-
(2007)
Journal of Applied Physics
, vol.101
, Issue.2
, pp. 024908
-
-
Saenger, K.L.1
De Souza, J.P.2
Fogel, K.E.3
Ott, J.A.4
Sung, C.Y.5
Sadana, D.K.6
Yin, H.7
-
9
-
-
34250671643
-
Solid phase epitaxy versus random nucleation and growth in sub- 20 nm wide fin field-effect transistors
-
DOI 10.1063/1.2749186
-
R. Duffy, M. van Dal, B. Pawlak, M. Kaiser, R. Weemaes, B. Degroote, E. Lunnen, and E. Al-tamirano, Appl. Phys. Lett. 90, 241912 (2007). 10.1063/1.2749186 (Pubitemid 46934763)
-
(2007)
Applied Physics Letters
, vol.90
, Issue.24
, pp. 241912
-
-
Duffy, R.1
Van Dal, M.J.H.2
Pawlak, B.J.3
Kaiser, M.4
Weemaes, R.G.R.5
Degroote, B.6
Kunnen, E.7
Altamirano, E.8
-
10
-
-
67349175308
-
-
10.1016/j.sse.2009.03.017
-
I. Ferain, R. Duffy, N. Collaert, M. J. H. van Dal, B. J. Pawlak, B. O'Sullivan, L. Witters, R. Rooyackers, T. Conard, M. Popovici, S. van Elshocht, M. Kaiser, R. G. R. Weemaes, J. Swerts, M. Jurczak, R. J. P. Lander, and K. De Meyer, Solid-State Electron. 53, 760 (2009). 10.1016/j.sse.2009.03.017
-
(2009)
Solid-State Electron.
, vol.53
, pp. 760
-
-
Ferain, I.1
Duffy, R.2
Collaert, N.3
Van Dal, M.J.H.4
Pawlak, B.J.5
O'Sullivan, B.6
Witters, L.7
Rooyackers, R.8
Conard, T.9
Popovici, M.10
Van Elshocht, S.11
Kaiser, M.12
Weemaes, R.G.R.13
Swerts, J.14
Jurczak, M.15
Lander, R.J.P.16
De Meyer, K.17
-
11
-
-
0009716113
-
-
10.1063/1.94217
-
H. Ishiwara, H. Yamamoto, S. Furukawa, M. Tamura, and T. Tokuyama, Appl. Phys. Lett. 43, 1028 (1983). 10.1063/1.94217
-
(1983)
Appl. Phys. Lett.
, vol.43
, pp. 1028
-
-
Ishiwara, H.1
Yamamoto, H.2
Furukawa, S.3
Tamura, M.4
Tokuyama, T.5
-
12
-
-
0021463322
-
2 boundary
-
DOI 10.1063/1.333958
-
Y. Kunni, T. Michibaru, and K. Kajiyama, J. Appl. Phys. 56, 279 (1984). 10.1063/1.333958 (Pubitemid 14626809)
-
(1984)
Journal of Applied Physics
, vol.56
, Issue.2
, pp. 279-285
-
-
Kunii, Y.1
Tabe, M.2
Kajiyama, K.3
-
13
-
-
38649140309
-
-
M. van Dal, N. Collaert, G. Doornbos, G. Vellianitis, G. Curatola, B. Pawlak, R. Duffy, C. Jonville, B. Degroote, E. Altamirano, E. Kunnen, M. Demand, S. Beckx, T. Vandeweyer, C. Delvaux, F. Leys, A. Hikavyy, R. Rooyackers, M. Kaiser, R. G. R. Weemaes, S. Biesemans, M. Jurczak, K. Anil, L. Witters, and R. J. P. Lander, in Dig. Tech. Pap. - Symp. VLSI Technol. 2007, 110.
-
Dig. Tech. Pap. - Symp. VLSI Technol.
, vol.2007
, pp. 110
-
-
Van Dal, M.1
Collaert, N.2
Doornbos, G.3
Vellianitis, G.4
Curatola, G.5
Pawlak, B.6
Duffy, R.7
Jonville, C.8
Degroote, B.9
Altamirano, E.10
Kunnen, E.11
Demand, M.12
Beckx, S.13
Vandeweyer, T.14
Delvaux, C.15
Leys, F.16
Hikavyy, A.17
Rooyackers, R.18
Kaiser, M.19
Weemaes, R.G.R.20
Biesemans, S.21
Jurczak, M.22
Anil, K.23
Witters, L.24
Lander, R.J.P.25
more..
-
14
-
-
70350633029
-
-
T. Merelle, G. Curatola, G. Nackaerts, A. Collaert, M. J. H. van Dal, G. Doornbos, T. S. Doorn, P. Christie, G. Vellianitis, B. Duriez, R. Duffy, B. J. Pawlak, F. C. Voogt, R. Rooyackers, L. Witters, M. Jurczak, and R. J. P. Lander, in Tech. Dig.-Int. Electron Devices Meet. 2008, 241.
-
(2008)
Tech. Dig. - Int. Electron Devices Meet
, pp. 241
-
-
Merelle, T.1
Curatola, G.2
Nackaerts, G.3
Collaert, A.4
Van Dal, M.J.H.5
Doornbos, G.6
Doorn, T.S.7
Christie, P.8
Vellianitis, G.9
Duriez, B.10
Duffy, R.11
Pawlak, B.J.12
Voogt, F.C.13
Rooyackers, R.14
Witters, L.15
Jurczak, M.16
Lander, R.J.P.17
-
15
-
-
79251589685
-
-
L. Pelaz, R. Duffy, M. Aboy, L. A. Marqués, P. López, I. Santos, B. J. Pawlak, M. J. H. van Dal, B. Duriez, T. Merelle, G. Doornbos, N. Collaert, L. Witters, R. Rooyackers, W. Vandervorst, M. Jurczak, M. Kaiser, R. G. R. Weemaes, J. G. M. van Berkum, P. Breimer, and R. J. P. Lander, Tech. Dig.-Int. Electron Devices Meet. 2008, 535.
-
Tech. Dig. - Int. Electron Devices Meet.
, vol.2008
, pp. 535
-
-
Pelaz, L.1
Duffy, R.2
Aboy, M.3
Marqués, L.A.4
López, P.5
Santos, I.6
Pawlak, B.J.7
Van Dal, M.J.H.8
Duriez, B.9
Merelle, T.10
Doornbos, G.11
Collaert, N.12
Witters, L.13
Rooyackers, R.14
Vandervorst, W.15
Jurczak, M.16
Kaiser, M.17
Weemaes, R.G.R.18
Van Berkum, J.G.M.19
Breimer, P.20
Lander, R.J.P.21
more..
-
19
-
-
27744577658
-
-
10.1103/PhysRevB.39.5566
-
J. Tersoff, Phys. Rev. B 39, 5566 (1989). 10.1103/PhysRevB.39.5566
-
(1989)
Phys. Rev. B
, vol.39
, pp. 5566
-
-
Tersoff, J.1
-
21
-
-
1042277346
-
-
10.1016/j.nimb.2003.11.020
-
L. A. Marqués, L. Pelaz, M. Aboy, and J. Barbolla, Nucl. Instrum. Methods Phys. Res. B 216, 57 (2004). 10.1016/j.nimb.2003.11.020
-
(2004)
Nucl. Instrum. Methods Phys. Res. B
, vol.216
, pp. 57
-
-
Marqués, L.A.1
Pelaz, L.2
Aboy, M.3
Barbolla, J.4
-
22
-
-
0035878366
-
-
10.1103/PhysRevB.64.045214
-
L. A. Marqués, L. Pelaz, J. Hernndez, J. Barbolla, and G. H. Gilmer, Phys. Rev. B 64, 45214 (2001). 10.1103/PhysRevB.64.045214
-
(2001)
Phys. Rev. B
, vol.64
, pp. 45214
-
-
Marqués, L.A.1
Pelaz, L.2
Hernndez, J.3
Barbolla, J.4
Gilmer, G.H.5
-
24
-
-
0002531253
-
-
10.1063/1.364102
-
L. J. Porter, S. Yip, M. Yamaguchi, H. Kaburaki, and M. Tang, J. Appl. Phys. 81, 96 (1997). 10.1063/1.364102
-
(1997)
J. Appl. Phys.
, vol.81
, pp. 96
-
-
Porter, L.J.1
Yip, S.2
Yamaguchi, M.3
Kaburaki, H.4
Tang, M.5
-
25
-
-
0001051163
-
-
10.1103/PhysRevB.55.14279
-
M. Tang, L. Colombo, J. Zhu, and T. D. de la Rubia, Phys. Rev. B 55, 14279 (1997). 10.1103/PhysRevB.55.14279
-
(1997)
Phys. Rev. B
, vol.55
, pp. 14279
-
-
Tang, M.1
Colombo, L.2
Zhu, J.3
De La Rubia, T.D.4
-
27
-
-
0242352693
-
-
10.1103/PhysRevLett.91.135504
-
L. A. Marqués, L. Pelaz, M. Aboy, L. Enrquez, and J. Barbolla, Phys. Rev. Lett. 91, 135504 (2003). 10.1103/PhysRevLett.91.135504
-
(2003)
Phys. Rev. Lett.
, vol.91
, pp. 135504
-
-
Marqués, L.A.1
Pelaz, L.2
Aboy, M.3
Enrquez, L.4
Barbolla, J.5
-
29
-
-
19144366632
-
Ion-beam-induced amorphization and recrystallization in silicon
-
DOI 10.1063/1.1808484
-
L. Pelaz, L. A. Marqués, and J. Barbolla, J. Appl. Phys. 96, 5947 (2004). 10.1063/1.1808484 (Pubitemid 40715230)
-
(2004)
Journal of Applied Physics
, vol.96
, Issue.11
, pp. 5947-5976
-
-
Pelaz, L.1
Marqus, L.A.2
Barbolla, J.3
-
30
-
-
84857390872
-
-
Ph.D. thesis, Univ. de Valladolid, Spain
-
I. Santos, Ph.D. thesis, Univ. de Valladolid, Spain, 2010.
-
(2010)
-
-
Santos, I.1
-
32
-
-
0019923642
-
Some observations on the amorphous to crystalline transformation in silicon
-
DOI 10.1063/1.329901
-
B. Drosd and J. Washburn, J. Appl. Phys. 53, 397 (1982). 10.1063/1.329901 (Pubitemid 12467619)
-
(1982)
Journal of Applied Physics
, vol.53
, Issue.1
, pp. 397-403
-
-
Drosd, R.1
Washburn, J.2
|