메뉴 건너뛰기




Volumn 111, Issue 3, 2012, Pages

Molecular dynamics simulation of the regrowth of nanometric multigate Si devices

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS REGIONS; FREE SURFACES; LATERAL SURFACE; MOLECULAR DYNAMICS SIMULATIONS; NANOMETRICS; SI DEVICES;

EID: 84857409005     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3679126     Document Type: Article
Times cited : (10)

References (33)
  • 3
    • 84857398349 scopus 로고    scopus 로고
    • International Technology Roadmafor Semiconductors
    • See http://www.itrs.net/for International Technology Roadmap for Semiconductors.
  • 19
    • 27744577658 scopus 로고
    • 10.1103/PhysRevB.39.5566
    • J. Tersoff, Phys. Rev. B 39, 5566 (1989). 10.1103/PhysRevB.39.5566
    • (1989) Phys. Rev. B , vol.39 , pp. 5566
    • Tersoff, J.1
  • 29
    • 19144366632 scopus 로고    scopus 로고
    • Ion-beam-induced amorphization and recrystallization in silicon
    • DOI 10.1063/1.1808484
    • L. Pelaz, L. A. Marqués, and J. Barbolla, J. Appl. Phys. 96, 5947 (2004). 10.1063/1.1808484 (Pubitemid 40715230)
    • (2004) Journal of Applied Physics , vol.96 , Issue.11 , pp. 5947-5976
    • Pelaz, L.1    Marqus, L.A.2    Barbolla, J.3
  • 30
    • 84857390872 scopus 로고    scopus 로고
    • Ph.D. thesis, Univ. de Valladolid, Spain
    • I. Santos, Ph.D. thesis, Univ. de Valladolid, Spain, 2010.
    • (2010)
    • Santos, I.1
  • 32
    • 0019923642 scopus 로고
    • Some observations on the amorphous to crystalline transformation in silicon
    • DOI 10.1063/1.329901
    • B. Drosd and J. Washburn, J. Appl. Phys. 53, 397 (1982). 10.1063/1.329901 (Pubitemid 12467619)
    • (1982) Journal of Applied Physics , vol.53 , Issue.1 , pp. 397-403
    • Drosd, R.1    Washburn, J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.