Low-stress hyperbranched polymer/silica nanostructures produced by UV curing, sol/gel processing and nanoimprint lithography

Macromolecular Materials and Engineering

Volumn 297, Issue 2, 2012, Pages 155-166

  Geiser, Valérie ^a   Leterrier, Yves ^a   Månson, Jan Anders E ^a  

^a LABORATOIRE DE TECHNOLOGIE DES COMPOSITES ET POLYMÈRES LTC   (Switzerland)

Author keywords

hyperbranched polymers; internal stress; nanocomposites; photopolymerization; sol gel

Indexed keywords

DUAL-CURE; HYPERBRANCHED POLYMERS; INTERNAL STRESS; LOW STRESS; NANO-SIZED; PARTICULATE COMPOSITES; POWER-LAW DEPENDENCES; SILICA NANOPARTICLES; TRANSPARENT SOL; ULTRAFINE STRUCTURE; UV INTENSITY; UV NANOIMPRINT LITHOGRAPHY; UV-CURING;

CURING; NANOCOMPOSITES; NANOIMPRINT LITHOGRAPHY; PHOTOPOLYMERIZATION; POLYMERIZATION; SILICA;

DENDRIMERS;

EID: 84856596156     PISSN: 14387492     EISSN: 14392054     Source Type: Journal    
DOI: 10.1002/mame.201100108     Document Type: Article

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