Preparation and properties of nano-silica modified negative acrylate photoresist

Thin Solid Films

Volumn 516, Issue 23, 2008, Pages 8399-8407

  Lee, Chih Kang ^a   Don, Trong Ming ^a   Lai, Wei Chi ^a   Chen, Chin Chung ^a   Lin, Dar Jong ^a   Cheng, Liao Ping ^a  

^a TAMKANG UNIVERSITY   (Taiwan)

Author keywords

Binder; Organic inorganic nanohybrid; Photoresist; Sol gel method

Indexed keywords

BINDERS; BOND STRENGTH (CHEMICAL); CHEMICAL BONDS; CHEMICAL REACTIONS; COLLOIDS; ELECTRON BEAM LITHOGRAPHY; FOURIER TRANSFORMS; FREE RADICALS; GELATION; MICROELECTRONICS; MONOMERS; NANOSTRUCTURED MATERIALS; PHOTORESISTORS; PHOTORESISTS; POLYACRYLATES; POLYMERS; QUANTUM CHEMISTRY; RESINS; SILICA; SILICATE MINERALS; SILICON COMPOUNDS; SOL-GEL PROCESS; SURFACE TREATMENT; THERMOANALYSIS; THERMODYNAMIC PROPERTIES;

2-HYDROXY ETHYL METHACRYLATE; ACID VALUE; BENZYL METHACRYLATE; BINDER; CHEMICAL-; DIFFERENTIAL SCANNING CALORIMETER; DOUBLE BONDS; FOURIER TRANSFORM INFRARED SPECTROMETER; FREE-RADICAL POLYMERIZATIONS; GRAVIMETRIC ANALYZER; MECHANICAL ANALYZERS; METHACRYLIC ACID; MODIFIED SILICA PARTICLES; NANO-SILICA; NANOPARTICLES SUSPENSION; ORGANIC-INORGANIC NANOHYBRID; PHOTORESIST; POLYFUNCTIONAL MONOMERS; PREPARATION PROCESSES; SOL-GEL METHOD; SOL-GEL METHODS; THERMAL PROPERTIES;

FREE RADICAL POLYMERIZATION;

ACRYLATES; BINDERS; CHEMICAL BONDS; COPOLYMERS; ELECTRON BEAMS; FOURIER ANALYSIS; FREE RADICALS; LITHOGRAPHY; METHACRYLIC ACID; MOLECULAR WEIGHT; MONOMERS; POLYACRYLATES; POLYMERIZATION; SILICA; SYNTHESIS; VISCOSITY;

EID: 50849115159     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.04.051     Document Type: Article

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