Investigation of correlation between the microstructure and electrical properties of sol-gel derived ZnO based thin films

Journal of Applied Physics

Volumn 104, Issue 7, 2008, Pages

  Zhu, M W ^a   Gong, J ^a   Sun, C ^a   Xia, J H ^b   Jiang, X ^b  

^a INSTITUTE OF METAL RESEARCH   (China)

^b UNIVERSITY OF SIEGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM; BIOACTIVITY; CARRIER MOBILITY; CIVIL AVIATION; COLLOIDS; CONCENTRATION (PROCESS); ELECTRIC PROPERTIES; GALVANOMAGNETIC EFFECTS; GELATION; GELS; HALL EFFECT; HALL MOBILITY; HEATING; MAGNETIC FIELD EFFECTS; METALLIC FILMS; MICROSTRUCTURE; SEMICONDUCTING ZINC COMPOUNDS; SOL-GEL PROCESS; SOL-GELS; SOLS; THICK FILMS; ZINC ALLOYS; ZINC OXIDE;

COLUMNAR STRUCTURES; DOPED FILMS; DOPING; ELECTRICAL PROPERTIES; GRANULAR; HEATING TIMES; PURE ZNO; SCATTERING MECHANISMS; SOL-GEL METHODS; STRUCTURAL CHANGES; THIN-FILMS; ZNO FILMS;

CARRIER CONCENTRATION;

EID: 54049111016     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2993978     Document Type: Article

References (33)

1. O. Kluth, B. Rech, L. Houben, S. Wieder, G. Schope, C. Beneking, H. Wagner, A. Loffl, and H. W. Schock, Thin Solid Films 0040-6090 10.1016/S0040-6090(99)00085-1 351, 247 (1999).
2. T. Yamamoto, T. Shiosaki, and A. Kawabata, J. Appl. Phys. 0021-8979 10.1063/1.328100 51, 3113 (1980).
3. J. B. Lee, M. H. Lee, C. K. Park, and J. S. Park, Thin Solid Films 447-448, 296 (2004).
4. S. Major, A. Banerjee, and K. L. Chopra, Thin Solid Films 0040-6090 10.1016/0040-6090(84)90376-6 122, 31 (1984).
5. S. Choopun, R. D. Vispute, W. Noch, A. Balsamo, R. P. Sharma, T. Venkatesan, A. Iliadis, and D. C. Look, Appl. Phys. Lett. 0003-6951 10.1063/1.125503 75, 3947 (1999).
6. F. S. Hickernell, J. Appl. Phys. 0021-8979 10.1063/1.1662307 44, 1061 (1973).
7. B. Szyszka, S. Jaeger, J. Szczyrbowski, and G. Braeuer, Surf. Coat. Technol. 0257-8972 10.1016/S0257-8972(97)00145-X 98, 1304 (1998).
8. W. Tang and D. C. Cameron, Thin Solid Films 0040-6090 10.1016/0040-6090(94)90653-X 238, 83 (1994).
9. J. H. Lee and B. O. Park, Thin Solid Films 0040-6090 10.1016/S0040- 6090(03)00014-2 426, 94 (2003).
10. J. G. Lu, Z. Ye, J. Zeng, L. P. Zhu, L. Wang, J. Yuan, and B. H. Zhao, J. Appl. Phys. 0021-8979 10.1063/1.2357638 100, 073714 (2006).
11. S. Fujihara, C. Sasaki, and T. Kimura, Appl. Surf. Sci. 0169-4332 10.1016/S0169-4332(01)00367-1 180, 341 (2001).
12. G. K. Paul, S. Bandyopadhyay, S. K. Sen, and S. Sen, Mater. Chem. Phys. 0254-0584 10.1016/S0254-0584(02)00454-6 79, 71 (2003).
13. JCPDS powder diffraction File No. 36-1451.
14. J. G. Lu, Z. Z. Ye, J. Y. Huang, B. H. Zhao, and L. Wang, Chin. J. Semicond. 24, 729 (2003).
15. R. Cebulla, R. Wendt, and K. Ellmer, J. Appl. Phys. 0021-8979 10.1063/1.366798 83, 1087 (1998).
16. S. Maniv, W. D. Westwood, and E. Colombini, J. Vac. Sci. Technol. 0022-5355 10.1116/1.571350 20, 162 (1982).
17. J. Hinze and K. Ellmer, J. Appl. Phys. 0021-8979 10.1063/1.1288162 88, 2443 (2000).
18. M. W. Zhu, J. H. Xia, R. J. Hong, H. Abu-Samra, H. Huang, T. Staedler, J. Gong, C. Sun, and X. Jiang, J. Cryst. Growth 310, 816 (2008). 0022-0248
19. T. H. Jeong, M. R. Kim, and H. Seo, J. Appl. Phys. 0021-8979 10.1063/1.370803 86, 774 (1999).
20. H. Seo, T. H. Jeong, J. W. Park, C. Yeon, S. J. Kim, and S. Y. Kim, Jpn. J. Appl. Phys., Part 1 0021-4922 10.1143/JJAP.39.745 39, 745 (2000).
21. T. Schuler, T. Krajewski, I. Grobelsek, and M. A. Aegerter, J. Sol-Gel Sci. Technol. 0928-0707 10.1023/B:JSST.0000047994.49802.77 31, 235 (2004).
22. Y. Shigesato and D. C. Paine, Appl. Phys. Lett. 0003-6951 10.1063/1.108703 62, 1268 (1993).
23. R. B. H. Tahar and N. B. H. Tahar, J. Appl. Phys. 0021-8979 10.1063/1.1509083 92, 4498 (2002).
24. J. W. Orton and M. J. Powell, Rep. Prog. Phys. 0034-4885 10.1088/0034-4885/43/11/001 43, 1263 (1980).
25. V. Srikant, V. Sergo, and D. R. Clarke, J. Am. Ceram. Soc. 0002-7820 10.1111/j.1151-2916.1995.tb08913.x 78, 1935 (1995).
26. J. Bruneaux, H. Cachet, M. Froment, and A. Messad, Thin Solid Films 0040-6090 10.1016/0040-6090(91)90226-N 197, 129 (1991).
27. C. Kittel, Introduction to Solid State Physics, 6th ed. (Wiley, New York, 1986), Chap..
28. J. Y. W. Seto, J. Appl. Phys. 0021-8979 10.1063/1.321593 46, 5247 (1975).
29. Z. -C. Jin, I. Hamberg, and C. G. Granqvist, Appl. Phys. Lett. 0003-6951 10.1063/1.99008 51, 149 (1987).
30. R. B. Dingle, Philos. Mag. 46, 831 (1955). 1478-6435
31. K. Ellmer, J. Phys. D 0022-3727 10.1088/0022-3727/34/21/301 34, 3097 (2001).
32. C. Erginsoy, Phys. Rev. 79, 1013 (1950).
33. M. W. Zhu, H. Huang, J. Gong, C. Sun, and X. Jiang, J. Appl. Phys. 0021-8979 10.1063/1.2772591 102, 043106 (2007).