A high Q micromachined single crystal silicon bulk mode resonator with pre-etched cavity

Microsystem Technologies

Volumn 18, Issue 1, 2012, Pages 25-30

  Wu, Guoqiang ^a,b   Xu, Dehui ^a   Xiong, Bin ^a   Wang, Yuelin ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BULK-MODE; DEVICE STRUCTURES; FABRICATION PROCESS; FABRICATION YIELD; MICROMACHINED; QUALITY FACTORS; RESONATOR STRUCTURES; SINGLE CRYSTAL SILICON; SQUARE RESONATORS; SUBSTRATE LAYERS; TRANSMISSION PERFORMANCE;

FABRICATION; RESONATORS; SINGLE CRYSTALS;

SILICON WAFERS;

EID: 84856020594     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-011-1372-1     Document Type: Article

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