High-Q single crystal silicon HARPSS capacitive beam resonators with self-aligned sub-100-nm transduction gaps

Journal of Microelectromechanical Systems

Volumn 12, Issue 4, 2003, Pages 487-496

  Pourkamali, Siavash ^a   Hashimura, Akinori ^a,b   Abdolvand, Reza ^a   Ho, Gavin K ^a   Erbil, Ahmet ^c   Ayazi, Farrokh ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^b Panasonic   (Japan)

^c GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Capacitive gap; HARPSS; Quality factor; Resonator; Silicon micromachining; Submicron; Thermoelastic damping

Indexed keywords

ASPECT RATIO; DAMPING; ELECTROSTATICS; ENERGY GAP; FINITE ELEMENT METHOD; NATURAL FREQUENCIES; POLYSILICON; SINGLE CRYSTALS; THERMOELASTICITY;

CAPACITIVE BEAM RESONATORS; HIGH ASPECT RATIO COMBINED POLY AND SINGLE CRYSTAL SILICON; SINGLE CRYSTAL SILICON; TRANSDUCTION GAPS;

MICROELECTROMECHANICAL DEVICES;

EID: 0041886902     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2003.811726     Document Type: Article

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