A surface properties of ZrO 2 thin films using adaptively coupled plasma source

Journal of the Electrochemical Society

Volumn 159, Issue 2, 2012, Pages

  Woo, Jong Chang ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COUPLED PLASMA; CRYSTALLINE STRUCTURE; ETCH MECHANISM; ETCHING MECHANISM; GASES MIXING; NONVOLATILITY; PLASMA DAMAGE; SURFACE CHARACTERISTICS;

BROMINE; CRYSTAL STRUCTURE; EMISSION SPECTROSCOPY; INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; OPTICAL EMISSION SPECTROSCOPY; SURFACE PROPERTIES; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIUM; ZIRCONIUM ALLOYS;

SURFACE REACTIONS;

EID: 84855301472     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/2.040202jes     Document Type: Article

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