-
2
-
-
0024104046
-
The space radiation environment for electronics
-
E.G. Stassinopolous and J.P Raymond, "The Space Radiation Environment for Electronics," Proc. IEEE 76 (1988) 1423-1442.
-
(1988)
Proc. IEEE
, vol.76
, pp. 1423-1442
-
-
Stassinopolous, E.G.1
Raymond, J.P.2
-
3
-
-
0020304245
-
The natural radiation environment inside a spacecraft
-
J.H. Adams, Jr., "The Natural Radiation Environment Inside a Spacecraft," IEEE Trans. Nucl. Sci. 29 (1983) 2095-2100.
-
(1983)
IEEE Trans. Nucl. Sci.
, vol.29
, pp. 2095-2100
-
-
Adams Jr., J.H.1
-
4
-
-
0032256942
-
A new geneeration of high voltage MOSFETs breaks the limit line of silicon
-
G. DeBoy, M. Marz, J.P. Stengl, H. Strack, J. Tihanyi, and H. Weber, "A New Geneeration of High Voltage MOSFETs Breaks the Limit Line of Silicon," Tech. Digest Int. Electron Device Mtg. (1998) 683-685.
-
(1998)
Tech. Digest Int. Electron Device Mtg.
, pp. 683-685
-
-
Deboy, G.1
Marz, M.2
Stengl, J.P.3
Strack, H.4
Tihanyi, J.5
Weber, H.6
-
5
-
-
0001520716
-
The future of power semiconductor device technology
-
B.J. Baliga, "The Future of Power Semiconductor Device Technology," Proc. IEEE 89 (2001) 822-832.
-
(2001)
Proc. IEEE
, vol.89
, pp. 822-832
-
-
Baliga, B.J.1
-
9
-
-
0003232234
-
A comparison of modern power device concepts for high voltage applications: Field stop-IGBT, compensation devices and SiC devices
-
G. Deboy, H. Hulsken, H. Mitlehner, and R. Rupp, "A Comparison of Modern Power Device Concepts for High Voltage Applications: Field Stop-IGBT, Compensation Devices and SiC Devices," Proc. Bipolar/BiCMOS Circuits and Technology Mtg. (2000) 134-141.
-
(2000)
Proc. Bipolar/BiCMOS Circuits and Technology Mtg.
, pp. 134-141
-
-
Deboy, G.1
Hulsken, H.2
Mitlehner, H.3
Rupp, R.4
-
10
-
-
0038642526
-
Significantly improved performance of MOSFETs on silicon carbide using the 15R-SiC polytype
-
R. Schomer, P. Friedrichs, D. Peters, and D. Stephani, "Significantly Improved Performance of MOSFETs on Silicon Carbide Using the 15R-SiC Polytype," IEEE Elect Dev. Lett 20 (1999) 241-244.
-
(1999)
IEEE Elect Dev. Lett
, vol.20
, pp. 241-244
-
-
Schomer, R.1
Friedrichs, P.2
Peters, D.3
Stephani, D.4
-
14
-
-
0036540124
-
Effects of hydrogen transport and reactions on microelectronics radiation response and reliability
-
D.M. Fleetwood, "Effects of Hydrogen Transport and Reactions on Microelectronics Radiation Response and Reliability," Microelectronics Reliability 42 (2002) 523-541.
-
(2002)
Microelectronics Reliability
, vol.42
, pp. 523-541
-
-
Fleetwood, D.M.1
-
15
-
-
0022600166
-
Simple technique for separating the effects of interface traps and trapped-oxide charge in metal-oxide-semiconductor transistors
-
P.J. McWhorter and P.S. Winokur, "Simple Technique for Separating the Effects of Interface Traps and Trapped-Oxide Charge in Metal-Oxide-Semiconductor Transistors," Appl. Phys. Lett. 48 (1985) 133-135.
-
(1985)
Appl. Phys. Lett.
, vol.48
, pp. 133-135
-
-
McWhorter, P.J.1
Winokur, P.S.2
-
16
-
-
0025405045
-
MOS device degradation due to total dose ionizing radiation in the natural space environment: A review
-
K.F. Galloway and R.D. Schrimpf, "MOS Device Degradation due to Total Dose Ionizing Radiation in the Natural Space Environment: A Review," Microelectronics J. 21 (1990) 67-81.
-
(1990)
Microelectronics J.
, vol.21
, pp. 67-81
-
-
Galloway, K.F.1
Schrimpf, R.D.2
-
17
-
-
0021609581
-
Super recovery of total dose damage in MOS devices
-
A.H. Johnston, "Super Recovery of Total Dose Damage in MOS Devices," IEEE Trans. Nucl. Sci. 31 (1984) 1427-1433.
-
(1984)
IEEE Trans. Nucl. Sci.
, vol.31
, pp. 1427-1433
-
-
Johnston, A.H.1
-
19
-
-
0023562596
-
Total-dose failure mechanisms of integrated circuits in laboratory and space environments
-
P.S. Winokur, F.W. Sexton, G.L. Hash, D.C. Turpin, "Total-Dose Failure Mechanisms of Integrated Circuits in Laboratory and Space Environments," IEEE Trans. Nucl. Sci. 34 (1987) 1448-1454.
-
(1987)
IEEE Trans. Nucl. Sci.
, vol.34
, pp. 1448-1454
-
-
Winokur, P.S.1
Sexton, F.W.2
Hash, G.L.3
Turpin, D.C.4
-
20
-
-
0024176509
-
Dose-rate effects on the total-dose threshold-voltage shift of power MOSFETs
-
R.D. Schrimpf, P.J. Wahle, R.C. Andrews, D.B. Cooper, and K.F. Galloway, "Dose-Rate Effects on the Total-Dose Threshold-Voltage Shift of Power MOSFETs," IEEE Trans. Nucl. Sci. 35 (1988) 1536-1540.
-
(1988)
IEEE Trans. Nucl. Sci.
, vol.35
, pp. 1536-1540
-
-
Schrimpf, R.D.1
Wahle, P.J.2
Andrews, R.C.3
Cooper, D.B.4
Galloway, K.F.5
-
21
-
-
0020269823
-
Ionizing radiation effects on power MOSFETs during high speed switching
-
D.L. Blackburn, D.W. Berning, J.M. Benedetto, and K.F. Galloway, "Ionizing Radiation Effects on Power MOSFETs During High Speed Switching," IEEE Trans. Nucl. Sci. 29 (1982) 1555-1558.
-
(1982)
IEEE Trans. Nucl. Sci.
, vol.29
, pp. 1555-1558
-
-
Blackburn, D.L.1
Berning, D.W.2
Benedetto, J.M.3
Galloway, K.F.4
-
22
-
-
0025462772
-
Simulated space radiation effects on power MOSFETs in switching power supplies
-
P.J. Wahle, R.D. Schrimpf, and K.F. Galloway, "Simulated Space Radiation Effects on Power MOSFETs in Switching Power Supplies," IEEE Trans. Industry Appl. 26 (1990) 798-802.
-
(1990)
IEEE Trans. Industry Appl.
, vol.26
, pp. 798-802
-
-
Wahle, P.J.1
Schrimpf, R.D.2
Galloway, K.F.3
-
23
-
-
0021609193
-
A simple model for separating interface and oxide charge effects in MOS device characteristics
-
K.F. Galloway, M. Gaitan, and T.J. Russell, "A Simple Model for Separating Interface and Oxide Charge Effects in MOS Device Characteristics," IEEE Trans. Nucl. Sci. 31 (1984) 1497-1501.
-
(1984)
IEEE Trans. Nucl. Sci.
, vol.31
, pp. 1497-1501
-
-
Galloway, K.F.1
Gaitan, M.2
Russell, T.J.3
-
24
-
-
0027886813
-
Separation of effects of oxide-trapped charge and interface-trapped charge on mobility in irradiated power MOSFETs
-
D. Zupac, P. Khosropour, S. Anderson, R.D. Schrimpf, and K.F. Galloway, "Separation of Effects of Oxide-Trapped Charge and Interface-Trapped Charge on Mobility in Irradiated Power MOSFETs," IEEE Trans. Nucl. Sci. 40 (1993) 1307-1315.
-
(1993)
IEEE Trans. Nucl. Sci.
, vol.40
, pp. 1307-1315
-
-
Zupac, D.1
Khosropour, P.2
Anderson, S.3
Schrimpf, R.D.4
Galloway, K.F.5
-
25
-
-
84915608139
-
Silicon power field controlled devices
-
(D. Kahng, ed.), Academic Press, New York
-
B. J. Baliga, "Silicon Power Field Controlled Devices," in: Silicon Integrated Circuits, Part B, (D. Kahng, ed.), Academic Press, New York, pp. 158-174, 1981.
-
(1981)
Silicon Integrated Circuits, Part B
, pp. 158-174
-
-
Baliga, B.J.1
-
26
-
-
0020193209
-
High-voltage device termination techniques - A comparative review
-
B. J. Baliga, "High-Voltage Device Termination Techniques - A Comparative Review," IEE Proc. 129 (1982) 173-179.
-
(1982)
IEE Proc.
, vol.129
, pp. 173-179
-
-
Baliga, B.J.1
-
28
-
-
0020902952
-
The effects of ionizing radiation on the breakdown voltage of power MOSFETs
-
D. L. Blackburn, J. M. Benedetto, and K. F. Galloway, "The Effects of Ionizing Radiation on the Breakdown Voltage of Power MOSFETs," IEEE Trans. Nucl. Sci. 30 (1983) 4116-4121.
-
(1983)
IEEE Trans. Nucl. Sci.
, vol.30
, pp. 4116-4121
-
-
Blackburn, D.L.1
Benedetto, J.M.2
Galloway, K.F.3
-
29
-
-
0022898901
-
Characteristics of the breakdown voltage of power MOSFETS after total dose irradiation
-
R. D. Pugh, A. H. Johnson, and K. F. Galloway, "Characteristics of the Breakdown Voltage of Power MOSFETs After Total Dose Irradiation," IEEE Trans. Nucl. Sci. 33 (1986) 1460-1464.
-
(1986)
IEEE Trans. Nucl. Sci.
, vol.33
, pp. 1460-1464
-
-
Pugh, R.D.1
Johnson, A.H.2
Galloway, K.F.3
-
30
-
-
0024923685
-
The effects of ionizing radiation on power-MOSFET termination structures
-
K.R. Davis, R.D. Schrimpf, F.E. Cellier, K.F. Galloway, D.I. Burton, and C.F. Wheatley, Jr., "The Effects of Ionizing Radiation on Power-MOSFET Termination Structures," IEEE Trans. Nucl. Sci. 36 (1989) 2104-2109.
-
(1989)
IEEE Trans. Nucl. Sci.
, vol.36
, pp. 2104-2109
-
-
Davis, K.R.1
Schrimpf, R.D.2
Cellier, F.E.3
Galloway, K.F.4
Burton, D.I.5
Wheatley Jr., C.F.6
-
31
-
-
0025592878
-
The effects of ionizing radiation on the breakdown voltage of p-channel power MOSFETs
-
S.L. Kosier, R.D. Schrimpf, F.E. Cellier, and K.F. Galloway, "The Effects of Ionizing Radiation on the Breakdown Voltage of P-Channel Power MOSFETs," IEEE Trans. Nucl. Sci. 37 (1990) 2076-2082.
-
(1990)
IEEE Trans. Nucl. Sci.
, vol.37
, pp. 2076-2082
-
-
Kosier, S.L.1
Schrimpf, R.D.2
Cellier, F.E.3
Galloway, K.F.4
-
32
-
-
0003412161
-
-
Pergamon Press Inc., Elmsford, NY
-
J.F. Zeigler, J.P. Biersack, and U. Littmark, The Stopping and Range of Ions in Solids. Pergamon Press Inc., Elmsford, NY, 1985.
-
(1985)
The Stopping and Range of Ions in Solids
-
-
Zeigler, J.F.1
Biersack, J.P.2
Littmark, U.3
-
33
-
-
0000765733
-
Practical approach to ion track energy distribution
-
W.J. Stapor and P.T. McDonald, "Practical Approach to Ion Track Energy Distribution," J. Appl. Phys 64 (1988) 4430-4434.
-
(1988)
J. Appl. Phys
, vol.64
, pp. 4430-4434
-
-
Stapor, W.J.1
McDonald, P.T.2
-
34
-
-
0028697026
-
High energy heavy-ion-induced single event transients in epitaxial structures
-
H. Dussault, J.W. Howard, Jr., R.C. Block, M.R. Pinto, W.J. Stapor, and A.R. Knudson, "High Energy Heavy-Ion-Induced Single Event Transients in Epitaxial Structures," IEEE Trans. Nucl. Sci. 41 (1994) 2018-2025.
-
(1994)
IEEE Trans. Nucl. Sci.
, vol.41
, pp. 2018-2025
-
-
Dussault, H.1
Howard Jr., J.W.2
Block, R.C.3
Pinto, M.R.4
Stapor, W.J.5
Knudson, A.R.6
-
35
-
-
0022921353
-
Burnout of power MOS transistors with heavy ions of Californium-252
-
A.E. Waskiewicz, J.W. Groninger, V.H. Strahan, and D.M. Long, "Burnout of Power MOS Transistors with Heavy Ions of Californium-252, " IEEE Trans. Nucl. Sci. 33 (1986) 1710-1713.
-
(1986)
IEEE Trans. Nucl. Sci.
, vol.33
, pp. 1710-1713
-
-
Waskiewicz, A.E.1
Groninger, J.W.2
Strahan, V.H.3
Long, D.M.4
-
36
-
-
0023560044
-
Heavy-ion induced gate rupture in power MOSFETs
-
T.A. Fischer, "Heavy-Ion Induced Gate Rupture in Power MOSFETs," IEEE Trans. Nucl. Sci. 34 (1987) 1786-1791.
-
(1987)
IEEE Trans. Nucl. Sci.
, vol.34
, pp. 1786-1791
-
-
Fischer, T.A.1
-
37
-
-
0027594721
-
Simulating single-event-burnout of N-channel power MOSFETs
-
G.H. Johnson, J.H. Hohl, R.D. Schrimpf, and K.F. Galloway, "Simulating Single-Event-Burnout of N-Channel Power MOSFETs," IEEE Trans. Electron Dev. 40 (1993) 1001-1008.
-
(1993)
IEEE Trans. Electron Dev.
, vol.40
, pp. 1001-1008
-
-
Johnson, G.H.1
Hohl, J.H.2
Schrimpf, R.D.3
Galloway, K.F.4
-
38
-
-
0028697338
-
Observations of single-event failure in power MOSFETs
-
D.K. Nichols, K.P. McCarty, J.R. Cross, A. Waskiewicz, J. Groninger, D. Oberg, J. Wert, P. Majewski, and R. Koga, "Observations of Single-Event Failure in Power MOSFETs," IEEE Radiation Effects Data Workshop Record (1994) 41-54.
-
(1994)
IEEE Radiation Effects Data Workshop Record
, pp. 41-54
-
-
Nichols, D.K.1
McCarty, K.P.2
Cross, J.R.3
Waskiewicz, A.4
Groninger, J.5
Oberg, D.6
Wert, J.7
Majewski, P.8
Koga, R.9
-
39
-
-
0030127778
-
Experimental studies of single-event gate rupture and burnout in vertical power MOSFETs
-
J. L. Titus and C. F. Wheatley, "Experimental Studies of Single-Event Gate Rupture and Burnout in Vertical Power MOSFETs," IEEE Trans. Nucl. Sci. 43 (1996) 533-545.
-
(1996)
IEEE Trans. Nucl. Sci.
, vol.43
, pp. 533-545
-
-
Titus, J.L.1
Wheatley, C.F.2
-
40
-
-
0030350167
-
First observation of proton induced power MOSFET burnout in space: The CRUX experiment on APEX
-
J.W. Adolphsen, J.L. Barth, and G.B. Gee, "First Observation of Proton Induced Power MOSFET Burnout in Space: The CRUX Experiment on APEX, " IEEE Trans. Nucl. Sci. 43 (1996) 2921-2926.
-
(1996)
IEEE Trans. Nucl. Sci.
, vol.43
, pp. 2921-2926
-
-
Adolphsen, J.W.1
Barth, J.L.2
Gee, G.B.3
-
41
-
-
0022229389
-
Current induced avalanche in epitaxial structures
-
T.F. Wrobel, F.N. Coppage, G.L. Hash, and A.J. Smith, "Current Induced Avalanche in Epitaxial Structures." IEEE Trans. Nucl. Sci. 32 (1985) 3991-3995.
-
(1985)
IEEE Trans. Nucl. Sci.
, vol.32
, pp. 3991-3995
-
-
Wrobel, T.F.1
Coppage, F.N.2
Hash, G.L.3
Smith, A.J.4
-
42
-
-
84939713843
-
Solutions to heavy ion induced avalanche burnout in power devices
-
T.F. Wrobel and D.E. Beutler, "Solutions to Heavy Ion Induced Avalanche Burnout in Power Devices," IEEE Trans. Nucl. Sci. 39 (1996) 1636-1641.
-
(1996)
IEEE Trans. Nucl. Sci.
, vol.39
, pp. 1636-1641
-
-
Wrobel, T.F.1
Beutler, D.E.2
-
43
-
-
0028710491
-
Evidence of the ion's impact position effect on SEB in N-channel power MOSFETs
-
C. Dachs, F. Roubaud, J. M. Palau, G. Bruguier, J. Gasiot, P. Tastet, "Evidence of the Ion's Impact Position Effect on SEB in N-channel Power MOSFETs," IEEE Trans. Nucl. Sci. 41 (1994) 2167-2171.
-
(1994)
IEEE Trans. Nucl. Sci.
, vol.41
, pp. 2167-2171
-
-
Dachs, C.1
Roubaud, F.2
Palau, J.M.3
Bruguier, G.4
Gasiot, J.5
Tastet, P.6
-
44
-
-
0029492482
-
Simulation aided hardening of N-channel power MOSFETs to prevent single event burnout
-
C. Dachs, F. Roubaud, J. M. Palau, G. Bruguier, J. Gasiot, P. Tastet, M-C. Calvet, and P. Calvel, "Simulation Aided Hardening of N-channel Power MOSFETs to Prevent Single Event Burnout," IEEE Trans. Nucl. Sci. 42 (1995) 1935-1939.
-
(1995)
IEEE Trans. Nucl. Sci.
, vol.42
, pp. 1935-1939
-
-
Dachs, C.1
Roubaud, F.2
Palau, J.M.3
Bruguier, G.4
Gasiot, J.5
Tastet, P.6
Calvet, M.-C.7
Calvel, P.8
-
45
-
-
0030126134
-
A review of the techniques used for modeling single-event effects in power MOSFETs
-
G. H. Johnson, J. M. Palau, C. Dachs, K. F. Galloway, and R. D. Schrimpf, "A Review of the Techniques Used for Modeling Single-Event Effects in Power MOSFETs," IEEE Trans. Nucl. Sci. 43 (1996) 546-560.
-
(1996)
IEEE Trans. Nucl. Sci.
, vol.43
, pp. 546-560
-
-
Johnson, G.H.1
Palau, J.M.2
Dachs, C.3
Galloway, K.F.4
Schrimpf, R.D.5
-
46
-
-
0023562592
-
On heavy ion induced hard-errors in dielectric structures
-
T.F. Wrobel, "On Heavy Ion Induced Hard-Errors in Dielectric Structures," IEEE Trans. Nucl. Sci. 34 (1987) 1262-1268.
-
(1987)
IEEE Trans. Nucl. Sci.
, vol.34
, pp. 1262-1268
-
-
Wrobel, T.F.1
-
47
-
-
0027874496
-
A conceptual model of singel-event gate rupture in power MOSFETs
-
J.R. Brews, M.Allenspach, R.D. Schrimpf, K.F. Galloway, J.L. Titus, and C.F.Wheatley, "A Conceptual Model of Singel-Event Gate Rupture in Power MOSFETs," IEEE Trans. Nucl. Sci. 40 (1993) 1959-1966.
-
(1993)
IEEE Trans. Nucl. Sci.
, vol.40
, pp. 1959-1966
-
-
Brews, J.R.1
Allenspach, M.2
Schrimpf, R.D.3
Galloway, K.F.4
Titus, J.L.5
Wheatley, C.F.6
-
48
-
-
0028693951
-
Single-event gate rupture in vertical power MOSFETs: An original empirical expression
-
C. F. Wheatley, J. L. Titus, and D. I. Burton, "Single-Event Gate Rupture in Vertical Power MOSFETs: An Original Empirical Expression," IEEE Trans. Nucl. Sci. 41 (1994) 2152-2159.
-
(1994)
IEEE Trans. Nucl. Sci.
, vol.41
, pp. 2152-2159
-
-
Wheatley, C.F.1
Titus, J.L.2
Burton, D.I.3
-
49
-
-
0029546524
-
Impact of oxide thickness on SEGR
-
J. L. Titus, C. F. Wheatley, D. I. Burton, M. Allenspach, J. Brews, R.D. Schrimpf, K.F. Galloway, I. Mouret, and R.L. Pease,"Impact of Oxide Thickness on SEGR Failure in Vertical Power MOSFETs: Development of a Semi-Empirical Expression," IEEE Trans. Nucl. Sci. 42 (1995) 1928-1934.
-
(1995)
IEEE Trans. Nucl. Sci.
, vol.42
, pp. 1928-1934
-
-
Titus, J.L.1
Wheatley, C.F.2
Burton, D.I.3
Allenspach, M.4
Brews, J.5
Schrimpf, R.D.6
Galloway, K.F.7
Mouret, I.8
Pease, R.L.9
-
50
-
-
0345750992
-
Single-event gate rupture commercial power MOSFETs
-
D.K. Nichols, J.R. Cross, and K.P. McCarty, "Single-Event Gate Rupture Commercial Power MOSFETs," Conf. Record, RADECS 93 (1993) 462-467.
-
(1993)
Conf. Record, RADECS
, vol.93
, pp. 462-467
-
-
Nichols, D.K.1
Cross, J.R.2
McCarty, K.P.3
-
51
-
-
0033315055
-
Prediction of early lethal failures of VDMOSFETs for commercial space systems
-
J.L. Titus, C.F. Wheatley, T.H. Wheatley, W.A. Levinson, D.I. Burton, J.L. Barth, R.A. Reed, K.A. LaBel, J.W. Howard, and K.M. VanTyne, "Prediction of Early Lethal Failures of VDMOSFETs for Commercial Space Systems," IEEE Trans. Nucl. Sci. 46 (1999) 1640-1651.
-
(1999)
IEEE Trans. Nucl. Sci.
, vol.46
, pp. 1640-1651
-
-
Titus, J.L.1
Wheatley, C.F.2
Wheatley, T.H.3
Levinson, W.A.4
Burton, D.I.5
Barth, J.L.6
Reed, R.A.7
Label, K.A.8
Howard, J.W.9
Vantyne, K.M.10
-
52
-
-
0030129775
-
Measurement of a cross-section for single-event gate-rupture in power MOSFETs
-
I. Mouret, P. Calvel, M. Allenspach, J. L. Titus, C. F. Wheatley, Jr., K. A. Label, M. C. Calvet, R. D. Schrimpf, and K. F. Galloway, "Measurement of a Cross-Section for Single-Event Gate-Rupture in Power MOSFETs," IEEE Electron Dev. Lett. 17 (1996) 163-165.
-
(1996)
IEEE Electron Dev. Lett.
, vol.17
, pp. 163-165
-
-
Mouret, I.1
Calvel, P.2
Allenspach, M.3
Titus, J.L.4
Wheatley Jr., C.F.5
Label, K.A.6
Calvet, M.C.7
Schrimpf, R.D.8
Galloway, K.F.9
-
53
-
-
0028721235
-
Evaluation of SEGR threshold in power MOSFETs
-
M. Allenspach, J.R. Brews, I. Mouret, R.D. Schrimpf, and K.F. Galloway, "Evaluation of SEGR Threshold in Power MOSFETs," IEEE Trans. Nucl. Sci. 41 (1994) 2160-2166.
-
(1994)
IEEE Trans. Nucl. Sci.
, vol.41
, pp. 2160-2166
-
-
Allenspach, M.1
Brews, J.R.2
Mouret, I.3
Schrimpf, R.D.4
Galloway, K.F.5
-
54
-
-
0029545691
-
Single-event gate-rupture in power MOSFETs: Prediction of breakdown biases and evaluation of oxide thickness dependence
-
M. Allenspach, I. Mouret, J. L. Titus, C. F. Wheatley, Jr., R. L. Pease, J. R. Brews, R. D. Schrimpf, and K. F. Galloway, "Single-Event Gate-Rupture in Power MOSFETs: Prediction of Breakdown Biases and Evaluation of Oxide Thickness Dependence," IEEE Trans. Nucl. Sci. 42 (1995) 1922-1927.
-
(1995)
IEEE Trans. Nucl. Sci.
, vol.42
, pp. 1922-1927
-
-
Allenspach, M.1
Mouret, I.2
Titus, J.L.3
Wheatley Jr., C.F.4
Pease, R.L.5
Brews, J.R.6
Schrimpf, R.D.7
Galloway, K.F.8
-
55
-
-
0030359034
-
SEGR and SEB in N-channel power MOSFETs
-
M. Allenspach, C. Dachs, G.H. Johnson, R.D. Schrimpf, E. Lorfevre, J.M. Palau, J.R. Brews, K.F. Galloway, J.L. Titus, and C.F. Wheatley, "SEGR and SEB in N-Channel Power MOSFETs," IEEE Trans. Nucl. Sci. 43 (1996) 2927-2931.
-
(1996)
IEEE Trans. Nucl. Sci.
, vol.43
, pp. 2927-2931
-
-
Allenspach, M.1
Dachs, C.2
Johnson, G.H.3
Schrimpf, R.D.4
Lorfevre, E.5
Palau, J.M.6
Brews, J.R.7
Galloway, K.F.8
Titus, J.L.9
Wheatley, C.F.10
-
56
-
-
0035721727
-
An improved stripeCell SEGR hardened power MOSFET technology
-
M.W. Savage, D.I. Burton, C.F. Wheatley, J.L. Titus, and J.E. Gillberg, "An Improved StripeCell SEGR Hardened Power MOSFET Technology," IEEE Trans. Nucl. Sci. 48 (2001) 1872-1878.
-
(2001)
IEEE Trans. Nucl. Sci.
, vol.48
, pp. 1872-1878
-
-
Savage, M.W.1
Burton, D.I.2
Wheatley, C.F.3
Titus, J.L.4
Gillberg, J.E.5
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