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Volumn 20, Issue 5, 1999, Pages 241-244

Significantly improved performance of MOSFET's on silicon carbide using the 15R-SiC polytype

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; ENERGY GAP; MOS CAPACITORS; SEMICONDUCTOR DOPING; SILICON CARBIDE;

EID: 0038642526     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.761027     Document Type: Article
Times cited : (245)

References (17)
  • 1
    • 11644295061 scopus 로고    scopus 로고
    • High voltage (2.6 kV) lateral DMOSFET's in 4H-SiC
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    • (1998) Mater. Sci. Forum , vol.264-268 , pp. 1005-1008
    • Spitz, J.1    Melloch, M.R.2    Cooper J.A., Jr.3    Capano, M.A.4
  • 3
    • 0041388292 scopus 로고    scopus 로고
    • Electron localization and noise in silicon carbide inversion layers
    • T. Ouisse, "Electron localization and noise in silicon carbide inversion layers," Philos. Mag. B, vol. 73, 1996, no. 2, pp. 325-337.
    • (1996) Philos. Mag. B , vol.73 , Issue.2 , pp. 325-337
    • Ouisse, T.1
  • 5
    • 5544260830 scopus 로고    scopus 로고
    • Interface properties of metal-oxide-semiconductor structures on n-type 6H and 4H-SiC
    • P. Friedrichs, E. P. Burte, and R. Schörner, "Interface properties of metal-oxide-semiconductor structures on n-type 6H and 4H-SiC," J. Appl. Phys., vol. 79, 1996, pp, 7814-7819.
    • (1996) J. Appl. Phys. , vol.79 , pp. 7814-7819
    • Friedrichs, P.1    Burte, E.P.2    Schörner, R.3
  • 7
    • 0003069736 scopus 로고    scopus 로고
    • Growth of SiC epitaxial layers in a vertical cold wall reactor suited for high voltage applications
    • R. Rupp, A. Wiedenhofer, P. Friedrichs, D. Peters, R. Schörner, and D. Stephani, "Growth of SiC epitaxial layers in a vertical cold wall reactor suited for high voltage applications," Mater. Sci. Forum, vol. 264-268, 1998, pp. 89-96.
    • (1998) Mater. Sci. Forum , vol.264-268 , pp. 89-96
    • Rupp, R.1    Wiedenhofer, A.2    Friedrichs, P.3    Peters, D.4    Schörner, R.5    Stephani, D.6
  • 10
  • 11
    • 0023998758 scopus 로고
    • New method for the extraction of MOSFET parameters
    • G. Ghibaudo, "New method for the extraction of MOSFET parameters," Electron. Lett., vol. 24, 1988, pp. 534-545.
    • (1988) Electron. Lett. , vol.24 , pp. 534-545
    • Ghibaudo, G.1
  • 16
    • 0345454518 scopus 로고    scopus 로고
    • Silicon carbide: Material and device properties
    • M. Willander and H. L. Hartnagel, Eds. London, U.K.: Chapman & Hall
    • Y. M. Tairov and M. Willander, "Silicon Carbide: Material and device properties," in High Temperature Electronics. M. Willander and H. L. Hartnagel, Eds. London, U.K.: Chapman & Hall, 1997, pp. 269-296.
    • (1997) High Temperature Electronics , pp. 269-296
    • Tairov, Y.M.1    Willander, M.2
  • 17
    • 0040195787 scopus 로고
    • Comparative investigation of the anisotropy of electrical conductivity in various SiC polytypes
    • G. A. Lomakina and Yu. A. Vodakov, "Comparative investigation of the anisotropy of electrical conductivity in various SiC polytypes," Sov. Phys.-Solid State, vol. 15, no. 1, 1973, pp. 83-86.
    • (1973) Sov. Phys.-Solid State , vol.15 , Issue.1 , pp. 83-86
    • Lomakina, G.A.1    Vodakov, Y.A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.