Charge induced pattern distortion in low energy electron beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3122-3125

  Satyalakshmi, K M ^a   Olkhovets, A ^a   Metzler, M G ^a   Harnett, C K ^a   Tanenbaum, D M ^a,b   Craighead, H G ^a  

^a Cornell University   (United States)

^b POMONA COLLEGE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRIC CHARGE; ELECTRIC CONDUCTIVITY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SUBSTRATES;

PATTERN DISTORTION;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034314803     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1321755     Document Type: Article

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