Effect of (Bi,Gd)FeO3 layer thickness on the microstructure and electrical properties of BiFeO3 thin films

Journal of the American Ceramic Society

Volumn 94, Issue 12, 2011, Pages 4291-4298

  Wu, Jiagang ^a   Wang, John ^b   Xiao, Dingquan ^a   Zhu, Jianguo ^a  

^a SICHUAN UNIVERSITY   (China)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

BI-LAYER; BI-LAYER STRUCTURE; BISMUTH FERRITES; DIELECTRIC BEHAVIOR; ELECTRICAL BEHAVIORS; FATIGUE BEHAVIOR; FATIGUE ENDURANCES; FATIGUE MECHANISM; FERROELECTRIC PROPERTY; FILM ORIENTATIONS; FREQUENCY-DEPENDENT; GRAIN SIZE; LAYER THICKNESS; RADIO FREQUENCY SPUTTERING; SINGLE LAYER; TIO;

BISMUTH; GADOLINIUM; IRON OXIDES; MICROSTRUCTURE; SILICON COMPOUNDS; THIN FILMS; TITANIUM DIOXIDE;

ELECTRIC PROPERTIES;

EID: 82955217683     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2011.04633.x     Document Type: Article

References (53)

1. 3 Prepared by Multi-Ion-Beam Sputtering," Appl. Phys. Lett., 68, 328-30 (1996). (Pubitemid 126683716)
2. 3 Artificial Lattice Toward High Dielectric Constant and its Nonlinearity," Appl. Phys. Lett., 82, 2118-20 (2003).
3. 3 Thin Film," Appl. Phys. Lett., 95, 192901 (2009).
4. 3 Superlattices With "Asymmetric" Structure," J. Appl. Phys., 91, 2290-4 (2002).
5. 3 Multilayered Thin Films Prepared by rf Magnetron Sputtering," Appl. Phys. Lett., 90, 082902 (2007).
6. 3 Structures With La Concentration Gradients," Appl. Phys. Lett., 77, 2231-3 (2000).
7. F. C. Kartawidjaja, C. H. Sim, and, J. Wang, " Microstructure and Texture Development in Single Layered and Heterolayered PZT Thin Films," J. Mater. Sci., 45, 6187-99 (2010).
8. 12 Bilayered Thin Films," J. Appl. Phys., 103, 034102 (2008).
9. 3 Multiferroic Thin Film Heterostructures," Science, 299, 1719-22 (2003). (Pubitemid 36337195)
10. 3," Science, 324, 63-6 (2009).
11. 3 Thin Films by Advanced x-ray Characterizations," Phys. Rev. B, 74, 020101 (2006).
12. L. W. Martin, Y. H. Chu, and, R. Ramesh, " Advances in the Growth and Characterization of Magnetic, Ferroelectric, and Multiferroic Oxide Thin Films," Mater. Sci. Eng. R, 68, 89-133 (2010).
13. R. Ramesh, " Materials Science: Emerging Routes to Multiferroics," Nature, 461, 1218-9 (2009).
14. G. Catalan, and, J. F. Scott, " Physics and Applications of Bismuth Ferrite," Adv. Mater., 21, 2463-85 (2009).
15. H. Béa, B. Dupé, S. Fusil, R. Mattana, E. Jacquet, B. Warot-Fonrose, F. Wilhelm, A. Rogalev, S. Petit, V. Cros, A. Anane, F. Petroff, K. Bouzehouane, G. Geneste, B. Dkhil, S. Lisenkov, I. Ponomareva, L. Bellaiche, M. Bibes, and, A. Barthélémy, " Evidence for Room-Temperature Multiferroicity in a Compound With a Giant Axial Ratio," Phys. Rev. Lett., 102, 217603 (2009).
16. 3 Single Crystals at Room Temperature and its Evolution Under Cycling Fields," Appl. Phys. Lett., 91, 022907 (2007).
17. 3," Phys. Rev. B, 71, 014113 (2005).
18. 3," Solid State Commun., 8, 1073-4 (1970).
19. 3 Thin Films due to Epitiaxial-Induced Transitions," Appl. Phys. Lett., 84, 5261-3 (2004).
20. 3 Thin Films," J. Appl. Phys., 106, 104111 (2009).
21. 3 Electrodes," Appl. Phys. Lett., 91, 102906 (2007).
22. 3 Thin Films," J. Appl. Phys., 102, 094109 (2007).
23. 3 Thin Films," J. Appl. Phys., 106, 054115 (2009).
24. 3 Thin Films," J. Appl. Phys., 106, 014103 (2009).
25. 3 Lead-Free Bilayered Thin Films," Appl. Phys. Lett., 94, 172906 (2009).
26. 6 Bilayered Films," Appl. Phys. Lett., 95, 232904 (2009).
27. 12 Multilayer Films Derived by Chemical Solution Deposition," J. Appl. Phys., 105, 084109 (2009).
28. 3 Ceramics," Solid State Commun., 138, 76-81 (2006).
29. 3 Thin Films," J. Appl. Phys., 103, 024103 (2008).
30. 3 Film Fabricated by Chemical Solution Deposition," J. Appl. Phys., 101, 09M103 (2007).
31. 3 Thin Films Prepared Using Metal Organic Decomposition," Appl. Phys. Lett., 91, 232909 (2007).
32. 3 Thin Films Through La and Nb Codoping," Phys. Rev. B, 77, 092101 (2008).
33. C. W. Nan, M. I. Bichurin, S. X. Dong, D. Viehland, and, G. Srinivasan, " Multiferroic Magnetoelectric Composites: Historical Perspective, Status, and Future Directions," J. Appl. Phys., 103, 031101 (2008).
34. 3 Membranes With Substantially Reduced Fatigue and Leakage," Appl. Phys. Lett., 92, 062910 (2008).
35. 3 Heterostructures," Appl. Phys. Lett., 81, 3624-6 (2002).
36. D. Damjanovic, " Ferroelectric, Dielectric and Piezoelectric Properties of Ferroelectric Thin Films and Ceramics," Rep. Prog. Phys., 61, 1267-324 (1998).
37. M. Dawber, and, J. F. Scott, " A Model for Fatigue in Ferroelectric Perovskite Thin Films," Appl. Phys. Lett., 76, 1060-2 (2000).
38. J. F. Scott, and, M. Dawber, " Oxygen-Vacancy Ordering as a Fatigue Mechanism in Perovskite Ferroelectrics," Appl. Phys. Lett., 76, 3801-3 (2000).
39. 9," Integr. Ferroelectr., 15, 53-67 (1997). (Pubitemid 127656895)
40. A. M. Bratkovsky, and, A. P. Levanyuk, " Abrupt Appearance of the Domain Pattern and Fatigue of Thin Ferroelectric Films," Phys. Rev. Lett., 84, 3177-80 (2000).
41. A. K. Tagantsev, I. Stolichnov, E. L. Colla, and, N. Setter, " Polarization Fatigue in Ferroelectric Films: Basic Experimental Findings, Phenomenological Scenarios, and Microscopic Features," J. Appl. Phys., 90, 1387-402 (2001). (Pubitemid 33664565)
42. 12 Ferroelectric Thin Films," Appl. Phys. Lett., 89, 122905 (2006).
43. J. F. M. Cillessen, M. W. J. Prins, and, R. M. Wolf, " Thickness Dependence of the Switching Voltage in all-Oxide Ferroelectric Thin-Film Capacitors Prepared by Pulsed Laser Deposition," J. Appl. Phys., 81, 2777-83 (1997). (Pubitemid 127584675)
44. Q. Y. Jiang, E. C. Subbarao, and, L. E. Cross, " Effect of Composition and Temperature on Electric Fatigue of La-Doped Lead Zirconate Titanate Ceramics," J. Appl. Phys., 75, 7433-43 (1994).
45. D. P. Almond, and, C. R. Bowen, " Anomalous Power Law Dispersions in ac Conductivity and Permittivity Shown to be Characteristics of Microstructural Electrical Networks," Phys. Rev. Lett., 92, 157601 (2004).
46. C. R. Bowen, and, D. P. Almond, " Modelling the 'Universal' Dielectric Response in Heterogeneous Materials Using Microstructural Electrical Networks," Mater. Sci. Technol., 22, 719-24 (2006). (Pubitemid 44502592)
47. A. Q. Jiang, Y. Y. Lin, and, T. A. Tang, " Charge Injection and Polarization Fatigue in Ferroelectric Thin Films," J. Appl. Phys., 102, 074109 (2007).
48. 3," Adv. Mater., 18, 1445-8 (2006). (Pubitemid 43893459)
49. 3," Appl. Phys. Lett., 86, 062903 (2005).
50. 3 Thin Films Grown at Various Oxygen Pressures by Pulsed Laser Deposition and Annealing Effect," J. Appl. Phys., 99, 054104 (2006).
51. U. Robels, and, G. Arlt, " Domain Wall Clamping in Ferroelectrics by Orientation of Defects," J. Appl. Phys., 73, 3454-60 (1993).
52. 3," Phys. Rev. B, 68, 134103 (2003).
53. 3: A Computer Simulation Study," J. Phys.: Condens. Matter, 15, 2301-7 (2003).